| AVS 49th International Symposium | |
| Nanometer Structures | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | NS+EL-WeA1 Invited Paper Recent Development in Nanoimprinting Lithography L.J. Guo, University of Michigan |
| 3:00pm | NS+EL-WeA4 Fabrication of Molecular Nanostructures by Scanning Near-Field Optical Lithography K.S.L. Chong, S. Sun, G.J. Leggett, University of Sheffield, UK |
| 3:20pm | NS+EL-WeA5 Photoinduced Anisotropy of Second-Harmonic Generation from Azobenzene-Modified Alkylsiloxane Monolayers Y.W. Yi, T.E. Furtak, Colorado School of Mines, M.J. Farrow, D.M. Walba, University of Colorado |
| 3:40pm | NS+EL-WeA6 Nanostructuring of Hydrogenated Silicon Surfaces by Electron Beam Irradiation of Self-assembled Hydroxybiphenyl Monolayers A. Küller, W. Geyer, V. Stadler, Universität Heidelberg, Germany, T. Weimann, Physikalisch Technische Bundesanstalt, Germany, W. Eck, A. Gölzhäuser, Universität Heidelberg, Germany |
| 4:00pm | NS+EL-WeA7 Electrode Modification by Electron-induced Patterning of Self-assembled Monolayers B. Völkel, G. Kaltenpoth, T. Felgenhauer, W. Geyer, H.T. Rong, Universität Heidelberg, Germany, M. Buck, University of St Andrews, UK, A. Gölzhäuser, Universität Heidelberg, Germany |
| 4:20pm | NS+EL-WeA8 Electrochemically Controlled Film Formation of Self-assembled Monolayers of Biphenyl-based Thiols I. Thom, B.J. Livesay, StAndrews University, UK, P. Cyganik, Jagiellonian University, Poland, M. Buck, StAndrews University, UK |
| 4:40pm | NS+EL-WeA9 Modification of Self-assembled Monolayers by Free Radical-dominant Plasma: The Effect of the Chain Length and the Substrate M. Zharnikov, S. Frey, M. Grunze, Universität Heidelberg, Germany, M.-C. Wang, J.-D. Liao, C.-C. Weng, Chung Yuan Christian University, Taiwan (ROC), R. Klauser, Synchrotron Radiation Research Center, Taiwan (ROC) |