Nanoimprinting lithography is an emerging technology that promises ultra-high resolution, high throughput and low cost. Unlike soft contact printing that uses an elastomer stamp, nanoimprinting uses a hard mold to create nanoscale features by directly imprinting into the polymer film at a temperature higher than its glass transition temperature (T@sub g@). Sub-10 nm resolution and large area patterning have already been demonstrated in the past. This talk will present some recent development in nanoimprinting lithography, including imprinting at reduced temperature by using low T@sub g@ polymer materials; a reversed imprinting technique that enables "inking" of polymer materials onto a substrate, and patterning on non-flat surfaces without planarization, as well as the creation of simple 3D structures. This reversal nanoimprinting method also offers a unique advantage by allowing imprinting onto a flexible substrate that is otherwise difficult to spin-coat with polymer film, and we have demonstrated this by imprinting on a 50 mm thick flexible polyimide film. Nanoimprinting not only has the ability to pattern nanoscale features, but also it is compatible with polymer material processing. Based on these characteristics, we have applied it to two new applications. The first one is polymer micro-ring resonator photonic device fabricated by nanoimprinting, which is in the form of a micro-ring closely coupled to a waveguide, and offers unique properties such as narrow bandwidth filtering, high quality factor, compactness, and could find important applications in integrated photonic circuits. The second application is in organic polymer light emitting diodes (OP-LEDs), where we have developed a simple method based on nanoimprinting to define the OP-LEDs with pixel size ranging from nano- to micron-scale. The demonstration of those small size OP-LEDs indicates the possibility of fabricating ultra-high resolution OP-LEDs for applications such as micro-displays.