AVS 49th International Symposium
    Nanometer Structures Wednesday Sessions
       Session NS+EL-WeA

Paper NS+EL-WeA7
Electrode Modification by Electron-induced Patterning of Self-assembled Monolayers

Wednesday, November 6, 2002, 4:00 pm, Room C-207

Session: Nanolithography & Self Assembly
Presenter: B. Völkel, Universität Heidelberg, Germany
Authors: B. Völkel, Universität Heidelberg, Germany
G. Kaltenpoth, Universität Heidelberg, Germany
T. Felgenhauer, Universität Heidelberg, Germany
W. Geyer, Universität Heidelberg, Germany
H.T. Rong, Universität Heidelberg, Germany
M. Buck, University of St Andrews, UK
A. Gölzhäuser, Universität Heidelberg, Germany
Correspondent: Click to Email
Nanopatterns on electrode surfaces control the electrochemical deposition. An example is the formation of nanoscale dots or wires via the preferred nucleation at defects and step edges.@footnote 1@ We present a method to artificially fabricate such electrochemical templates via coating of electrodes with self-assembled monolayers (SAMs) and subsequent patterning by electron beams. SAMs provide a flexible route to modify electrode surface properties via their molecular structure, ranging from inert alkane chains, which exhibit a blocking behavior, to redox active moieties. The e-beam patterning offers perspectives to generate arrays of microelectrodes with specific functionality. We coated gold electrodes with SAMs of w-(4'-methyl-biphenyl-4-yl)-dodecylthiol (BP12) and hexadecanethiol (HDT) and patterned them by electron beam lithography. The subsequent copper deposition in an electrochemical cell revealed that the e-beam patterned alkanethiol behaves opposite than e-beam patterned biphenyl. Similar to the behavior of these materials as resists,@footnote 2@ HDT acts as a "positive template" leading to copper deposition only on the irradiated parts. BP12 acts as a "negative template", where the irradiated biphenyl layer is cross linked and exhibits a blocking behavior,@footnote 3@ hence copper is only deposited on the non-irradiated parts. By using these effects well defined Cu nanostructures could be generated. @FootnoteText@ @footnote 1@ M. P. Zach, K.H. Ng, R.G.Penner, Science 290, 2120 (2000). @footnote 2@ A. Gölzhäuser, W. Geyer, V. Stadler, W. Eck, M. Grunze, K. Edinger, T. Weimann, P. Hinze, J. Vac. Sci. Technol B 18, 3414 (2000). @footnote 3@ T. Felgenhauer, C. Yan, H.T. Rong, A. Gölzhäuser, M. Buck, Appl. Phys. Lett. 79, 3323 (2001).