| AVS 49th International Symposium | |
| Manufacturing Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | MS+SE-MoM1 Product Development and Yield Enhancement through Failure Analysis of Integrated Circuits with Scanning Capacitance Microscopy P. Tangyunyong, C.Y. Nakakura, Sandia National Laboratories |
| 8:40am | MS+SE-MoM2 Integrated CD Metrology for Poly Si Etching G.P. Kota, C. Lee, Lam Research Corporation, T. Dziura, A. Levy, KLA-Tencor Corporation |
| 9:00am | MS+SE-MoM3 Invited Paper Metrology for Manufacturing U. Whitney, KLA-Tencor |
| 9:40am | MS+SE-MoM5 Measurements of Shallow Trench Isolation by Normal Incidence Optical Critical Dimension Technique J. Hu, D. Shivaprasad, F. Yang, R. Korlahalli, Nanometrics, Inc. |
| 10:00am | MS+SE-MoM6 The Evolution of Single Atomic Steps on vicinal Si(111) in NH@sub 4@F J. Fu, National Institute of Standards and Technology, H. Zhou, University of Maryland, J.A. Kramar, R. Silver, National Institute of Standards and Technology |
| 10:20am | MS+SE-MoM7 Invited Paper Real Time in situ Spectroellipsometry J.A. Woollam, B. Johs, J. Hale, J. A. Woollam Co., Inc. |
| 11:00am | MS+SE-MoM9 Real Time Process Control by Spectroellipsometry D. Daineka, P. Bulkin, T. Novikova, B. Drévillon, CNRS, Ecole Polytechnique, France |
| 11:20am | MS+SE-MoM10 In-Situ Studies of the Amorphous to Microcrystalline Transition of Hot-Wire CVD Si:H Films Using Real-Time Spectroscopic Ellipsometry D.H. Levi, B.P. Nelson, J.D. Perkins, National Renewable Energy Laboratory |
| 11:40am | MS+SE-MoM11 Post-Deposition Control of Resistivity and Anisotropy in ZnO Thin Films J.S. Lewis, B. Stoner, C. Pace, MCNC |