| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Dielectrics | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | DI-TuA1 Post-deposition Densification of Yttrium Oxide High Dielectric Constant Insulators Deposited by Oxygen Plasma Assisted Chemical Vapor Deposition D. Niu, R.W. Ashcraft, G.N. Parsons, North Carolina State University |
| 2:40pm | DI-TuA3 Substitutional Effects of the Dielectric Constant in Ta@sub 2@O@sub 5@ K. Larsson, J. Westlinder, H.-O. Blom, J. Olsson, Uppsala University, Sweden |
| 3:00pm | DI-TuA4 Ta d-state Derived Electron Traps in non-Crystalline Al@sub 2@O@sub 3@-Ta@sub 2@O@sub 5@ Alloys Prepared by Remote PECVD R.S. Johnson, J.G. Hong, G. Lucovsky, North Carolina State University |
| 3:20pm | DI-TuA5 Angle-Resolved XPS and Auger Analysis of Ultra-Thin Al@sub 2@O@sub 3@ Films Deposited by Atomic Layer Deposition O. Renault, D. Rouchon, L. Gosset, A. Ermolieff, CEA/Grenoble-LETI, France |
| 3:40pm | DI-TuA6 In-situ, Real Time Studies of Interface Formation of BST Thin Films on Si Substrates A.H. Mueller, N.A. Suvorova, E.A. Irene, University of North Carolina, Chapel Hill, O. Auciello, Argonne National Laboratory, J.A. Schultz, Ionwerks, Inc. |
| 4:00pm | DI-TuA7 Direct Observation of Atomic Disordering at the SrTiO@sub 3@/Si Interface Due to Oxygen Diffusion V. Shutthanandan, S. Thevuthasan, Y. Liang, Pacific Northwest National Laboratory, Z. Yu, R. Droopad, Motorola Labs |
| 4:20pm | DI-TuA8 Core-level Photoemission of High-K Dielectrics on Si Substrates J.E. Rowe, Army Research Office, M.D. Ulrich, R.S. Johnson, North Carolina State University, T.E. Madey, Rutgers University, G. Lucovsky, North Carolina State University |
| 4:40pm | DI-TuA9 Quadrupole Mass Spectrometer Studies of a High Temperature Etch Process St. Schneider, H. Kohlstedt, R. Waser, Forschungszentrum Juelich, Germany |
| 5:00pm | DI-TuA10 Spectroscopic Ellipsometry Characterization of High-k Dielectric Thin Films N.V. Nguyen, Y.J. Cho, R.A. Richter, J.R. Ehrstein, National Institute of Standards and Technology |