IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
Applied Surface Analysis | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | AS-MoA1 Satellite Structure in the KLL Auger spectra of Ge L. Kövér, I. Cserny, J. Tóth, D. Varga, Z. Berényi, Institute of Nuclear Research of the Hungarian Academy of Sciences, Hungary |
2:20pm | AS-MoA2 Optimized Analysis of Spectra: Application of Reciprocal-space Approaches to Broad, Sparse, and/or Multistructured Spectra D.E. Aspnes, North Carolina State University, S.D. Yoo, Serome Ventures, Inc., Seoul, Korea |
2:40pm | AS-MoA3 Quantitative AES and XPS - Databases Test Quantification Validity M.P. Seah, I.S. Gilmore, S.J. Spencer, National Physical Laboratory, UK |
3:00pm | AS-MoA4 Surface Excitations of Medium Energy Electrons in Metals and Semiconductors W.S.M. Werner, W. Smekal, C. Tomastik, H. Stoeri, Vienna University of Technology, Austria |
3:20pm | AS-MoA5 The Attenuation Length Revisited A. Jablonski, Polish Academy of Sciences, C.J. Powell, National Institute of Standards and Technology |
3:40pm | AS-MoA6 Comparisons of Practical Effective Attenuation Lengths and Inelastic Mean Free Paths for Applications in AES and XPS C.J. Powell, National Institute of Standards and Technology, A. Jablonski, Polish Academy of Sciences |
4:00pm | AS-MoA7 Surface Analysis of Hafnium Compounds by XPS using High Energy Zr Source P. Mrozek, D.F. Allgeyer, B. Vaartstra, Micron Technology, Inc. |
4:20pm | AS-MoA8 VAMAS TWA2 Project A2, Evaluation of Static Charge Stabilization and Determination Methods in XPS on Non-conducting Samples: Report on an Inter-laboratory Comparison W.E.S. Unger, Th. Gross, O. Boese, A. Lippitz, Th. Fritz, Bundesanstalt fuer Materialforschung und -pruefung (BAM), Germany, U. Gelius, Uppsala Universitet, Sweden |
4:40pm | AS-MoA9 Real and Gedanken Experiments Related to Surface Charging during XPS Measurements of Insulating Materials and Thin Films D.R. Baer, M.H. Engelhard, Y. Liang, A.S. Lea, D.J. Gaspar, C.F. Windisch, Pacific Northwest National Laboratory |
5:00pm | AS-MoA10 Core-level Photoemission of Zirconium and Hafnium Silicates for Use as High Dielectric Oxides R.L. Opila, R.B. Van Dover, G.D. Wilk, Agere Systems |