| AVS 47th International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+EL-WeA1 Monitoring of Thin Film Metallization by Metastable He Atom Scattering G. Witte, Lehrstuhl fuer Physikalische Chemie I, Germany, P. Fouquet, Physikalische Chemie I, RUB, Germany |
| 2:20pm | TF+EL-WeA2 Ultraviolet Absorption Spectroscopy of Polytetrafluoroethylene Deposition by Pyrolytic CVD B.A. Cruden, K.K. Gleason, H.H. Sawin, Massachusetts Institute of Technology |
| 2:40pm | TF+EL-WeA3 Near-edge Valence Band Structure of Amorphous Hydrogenated SiC Thin Films by a Combined use of Auger and Photoemission Processes M.-H. Lee, F.S. Ohuchi, University of Washington |
| 3:00pm | TF+EL-WeA4 Growth of Oxygen-rich Films on Ru(0001) A. Böttcher, B. Krenzer, W. Stenzel, H. Conrad, Fritz-Haber-Institut, Germany, H. Niehus, Humboldt-Universität, Germany |
| 3:20pm | TF+EL-WeA5 Invited Paper In-situ Characterization of Thin Film Growth W. Fukarek, Research Center Rossendorf, Germany |
| 4:00pm | TF+EL-WeA7 Characterization of the Phase Evolution of Boron Nitride Thin Films using Real Time Multichannel Ellipsometry from 1.5 to 6.5 eV J.A. Zapien, R. Messier, R.W. Collins, The Pennsylvania State University |
| 4:20pm | TF+EL-WeA8 Deposition of Hard Amorphous Hydrogenated Carbon Films from Hyperthermal Hydrocarbon Radicals, Studied by In Situ Real Time Infrared Spectroscopy A. von Keudell, Max-Planck-Institut für Plasmaphysik, Germany, K.Y. Letourneur, M.C.M. van de Sanden, TU Eindhoven, Netherlands |
| 4:40pm | TF+EL-WeA9 In-Situ Monitoring of Adsorption and Film Growth Using Infrared Reflection Absorption Spectroscopy V.M. Bermudez, W.J. DeSisto, Naval Research Laboratory |
| 5:00pm | TF+EL-WeA10 Investigation of the Subsonic Beam behaviour of an Expanding Thermal Plasma used to Deposit Silicondioxide like Films M.F.A.M van Hest, D.C. Schram, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |