AVS 47th International Symposium
    Thin Films Wednesday Sessions
       Session TF+EL-WeA

Paper TF+EL-WeA8
Deposition of Hard Amorphous Hydrogenated Carbon Films from Hyperthermal Hydrocarbon Radicals, Studied by In Situ Real Time Infrared Spectroscopy

Wednesday, October 4, 2000, 4:20 pm, Room 203

Session: In-situ Characterization of Thin Film Growth
Presenter: A. von Keudell, Max-Planck-Institut für Plasmaphysik, Germany
Authors: A. von Keudell, Max-Planck-Institut für Plasmaphysik, Germany
K.Y. Letourneur, TU Eindhoven, Netherlands
M.C.M. van de Sanden, TU Eindhoven, Netherlands
Correspondent: Click to Email
Dense and hard amorphous hydrogenated carbon films are deposited from a cascaded arc discharge from argon and using remote acetylene (C@sub 2@H@sub 2@) injection. The film formation is monitored by means of real time in situ ellipsometry and real time in situ infrared spectroscopy. From an enhanced infrared absorption at 3300 cm@super -1@ at the surface during deposition, corresponding to the stretching mode of sp@super 1@ hybridized CH groups, it is concluded that C@sub 2@H is the dominant growth precursor. This surface enhancement of the concentration of sp@super 1@ hybridized CH groups increases with increasing growth rate and film density. This variation of the growth rate and the variation of the film properties like mass density, hardness and hydrogen content can be well described by the balance between the contribution of C@sub 2@H and C@sub 2@H@sub 2@ to the incorporated carbon flux.