| AVS 47th International Symposium | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1+MS-WeA1 Supervision of Plasma Processes using Multiway Principal Component Analysis D. Knobloch, F.H. Bell, Infineon Technologies AG, Germany, K. Voigtlaender, J. Zimpel, Fraunhofer Institute IVI, Germany |
| 2:20pm | PS1+MS-WeA2 Invited Paper Sensors and Control in Plasma Processing J.C. Arnold, M.J. Hartig, C.F. Pfeiffer, J.A. Rivers, M.L. Johnson, Motorola Semiconductor Products Sector |
| 3:00pm | PS1+MS-WeA4 Run-to-Run and Real Time Process Control of Plasma Processes using an Inductive Antenna with Microsecond Resolution J. Mathuni, F.H. Bell, D. Knobloch, Infineon Technologies AG, Germany |
| 3:20pm | PS1+MS-WeA5 Improved Utility of Microwave Energy for Semiconductor Plasma Processing through RF System Stability Analysis and Enhancement P.W. Rummel, T. Grotjohn, Michigan State University |
| 3:40pm | PS1+MS-WeA6 Modeling and Real-time Control of RF Diode Sputtering for GMR Thin Film Deposition S. Ghosal, R.L. Kosut, J.L. Ebert, L. Porter, SC Solutions, Inc., D.J. Brownell, Nonvolatile Electronics, Inc., H.N.G. Wadley, University of Virginia |
| 4:00pm | PS1+MS-WeA7 Productivity Solutions for Eliminating Within-Wafer and Wafer-to-Wafer Variability in a Silicon Etch Process through Plasma and Surface Diagnostics E.A. Edelberg, L.B. Braly, V. Vahedi, J. Daugherty, Lam Research Corporation, S.J. Ullal, A.R. Godfrey, E.S. Aydil, University of California, Santa Barbara, H.K. Chiu, H.J. Tao, Taiwan Semiconductor Manufacturing Corp. |
| 4:20pm | PS1+MS-WeA8 Source Optimization for Magnetron Sputter-Deposition of NbTiN Tuning Elements for SIS THz Detectors N.N. Iosad, Delft University of Technology, The Netherlands, B.D. Jackson, J.R. Gao, Space Research Organization of the Netherlands, S.N. Polyakov, Moscow State University, P.N. Dmitriev, Russian Academy of Sciences, T.M. Klapwijk, Delft University of Technology, The Netherlands |
| 4:40pm | PS1+MS-WeA9 Multiwavelength In-Situ Ellipsometry for Optical Coatings Fabrication: Optimal Control Strategies and Results A. Hofrichter, D. Kouznetsov, P. Bulkin, B. Drevillon, Ecole Polytechnique, France |
| 5:00pm | PS1+MS-WeA10 Low Open Area Endpoint Detection of Plasma Etching Processes - Limitations and Signal to Noise Characterization B.E. Goodlin, D.S. Boning, H.H. Sawin, MIT, M. Yang, Texas Instruments, Inc. |