| AVS 47th International Symposium | |
| Manufacturing Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | MS-MoM1 Inline Quality Analysis in MBE Manufacturing of AlGaAs/InGaAs pHEMT Structure Using Photoreflectance and Contactless Electromodulation Spectroscopy G. Zhou, W. Liu, M. Lin, Alpha Industries, Inc. |
| 8:40am | MS-MoM2 Three Dimensional Reconstruction Metrology by Combinatory Multiple Parameter Characterization and Scanning Probe Microscopy E.C. Houge, Lucent Technologies and University of Central Florida, J.M. McIntosh, J.E. Griffith, Bell Laboratories, L.A. Giannuzzi, University of Central Florida, J.B. Bindell, Lucent Technologies |
| 9:00am | MS-MoM3 Application of Scanning Capacitance Microscopy to the Characterization of Semiconductor Device Operation C.Y. Nakakura, D.L. Hetherington, M.R. Shaneyfelt, P.E. Dodd, Sandia National Laboratories |
| 9:20am | MS-MoM4 Invited Paper Metrology with Electron Beams - The Current State and Future Directions D.C. Joy, University of Tennessee and Oak Ridge National Laboratory |
| 10:00am | MS-MoM6 Invited Paper Limitations of SIMS Depth Profiling for Shallow Implant and Thin Gate Dielectric Metrology M.G. Dowsett, University of Warwick, UK |