AVS 47th International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS-WeP

Paper PS-WeP28
Kinetic Modeling of High-Density Diamond Deposition Plasma Chemistry

Wednesday, October 4, 2000, 11:00 am, Room Exhibit Hall C & D

Session: Poster Session
Presenter: R. Blumenthal, Auburn University
Correspondent: Click to Email

The chemistry of electron cyclotron resonance (ECR) microwave plasmas capable of diamond film deposition has been modeled using only neutral molecule energetics under the assumption that the plasma serves only as a constant source of hydrogen atoms. Supersonic pulse, plasma sampling mass spectra of 2% ethane in hydrogen and deutrium, 2% ethylene in hydrogen and deuteruium, 2% acetylene in hydrogen and deuterium and 4% methane in hydrogen and deuterium plasmas all have been fit with a single set of four physically realistic plasma conditions that were the only variable parameters in the modeling. The results of the calculations indicate that the primary reactive chemistry of C@sub 2@H@sub X@ species is the stripping of hydrogen from the hydrocarbons to produce acetylene, C@sub 2@H@sub 2@, which then undergoes closed-cycles of H(D) atom addition and abstraction for the balance of the species's lifetime in the plasma. The abstraction is the result of two-body collisions of the hydrocarbon with H(D) atoms generated by the plasma, while the addition is by a three-body collision, which is not observed (either experimentally or in modeling) for species other than acetylene. The notable exception is the ethane radical, C@sub 2@H@sub 5@, which in addition to the stripping chemistry, may react with H(D) atoms in a two-body collision to produce two methyl radicals, CH@sub 3@. Recombination of the methyl radicals is found to occur through the three-body reaction that produces ethane, C@sub 2@H@sub 6@. In deuterium plasmas, the resulting ethane is isotopically labeled and is responsible for the deuterated ethylenes observed only in the ethane and methane plasmas.