AVS 47th International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS-WeP

Paper PS-WeP2
Design and Characterization of a Magnetic Pole Enhanced Inductively Coupled Plasma Source

Wednesday, October 4, 2000, 11:00 am, Room Exhibit Hall C & D

Session: Poster Session
Presenter: F. Rossi, Joint Research Center, Italy
Authors: T. Meziani, Joint Research Center, Italy
P.P. Colpo, Joint Research Center, Italy
F. Rossi, Joint Research Center, Italy
Correspondent: Click to Email
In the last decade, the ICs size shrinking has led to the development of a new generation of plasma source, enabling the generation of high plasma density with low ion energy: the Inductively Coupled Plasma sources (ICPs). ICP sources are widely used in semiconductor industry for their simple design, process flexibility and their high throughput. At present, the new challenge to be addressed is the scaling up of the plasma sources to enable large area specimen processing. Indeed, the semiconductor industry is now experiencing the transition from 200 to 300 mm wafer technology and plans the transition to 450 mm for 2010. On the other hand, the interest of the FPDs industry for larger area treatments is obvious for the flat video screen fabrication. The paper presents the design of a novel plasma source, enabling large area plasma treatment: the magnetic pole enhanced ICP (MaPE-ICP). The plasma source consists of a special arrangement comprising a special inductor embedded in a magnetic pole to create a concentrated and homogeneous magnetic field over large areas. We demonstrated that the plasma uniformity at laboratory scale (30cm) is better than the uniformity obtained with the classical ICP source on the same area. Furthermore, the obtained plasma characteristics (i.e. high densities of reactive species, low and controllable ion energy, wide pressure range) make the new source extremely promising for a whole range of processes such as large scale deposition, etching and plasma treatments. Finally, preliminary results of plasma density measurements over a large area MaPE-ICP reactor (1m x 1m) are presented.