AVS 47th International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS-WeP

Paper PS-WeP13
Comparing Polyatomic Ions and Plasmas for Organosiloxane Film Growth from HMDSO

Wednesday, October 4, 2000, 11:00 am, Room Exhibit Hall C & D

Session: Poster Session
Presenter: E.R. Fuoco, University of Illinois at Chicago
Authors: E.R. Fuoco, University of Illinois at Chicago
L. Hanley, University of Illinois at Chicago
A.J. Beck, The University of Sheffield, UK
P.N. Brookes, The University of Sheffield, UK
R.D. Short, The University of Sheffield, UK
Correspondent: Click to Email
Mass spectrometric sampling has found that large polyatomic ions are formed during plasma polymerization of hexamethyldisiloxane (HMDSO), implying that these ions could contribute to polymerization at the surface. This study uses mass spectrometric sampling to detect these ions in a low power HMDSO plasma. Adjacent work employs mass-selected beams of 15 - 100 eV Si@sub 2@O(CH@sub 3@)@sub 5@@super +@ ions to deposit organosiloxane films on Al surfaces. Monochromatic x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry are used to compare films formed from plasmas and those deposited from Si@sub 2@O(CH@sub 3@)@sub 5@@super +@ ion beams. These results support the argument that polyatomic ions and energetic neutrals play an important role in plasma polymerization.