| 8:40am |
TF-FrM2
Ion Beam Induced Defects and Phonon Confinement in 2H-WS@sub 2@ by "In-situ/Real-Time" Raman Measurements
F.S. Ohuchi, University of Washington, K. Ishioka, M. Kitajima, National Institute for Metals, Japan |
| 9:00am |
TF-FrM3 Invited Paper
Toward 'Virtual' Materials Processing Research
S.R. LeClair, Air Force Research Laboratory |
| 9:40am |
TF-FrM5
Stress Evolution during Growth of Epitaxial and Polycrystalline Metal Multilayers
V. Ramaswamy, W.D. Nix, B.M. Clemens, Stanford University |
| 10:00am |
TF-FrM6
Metallic Sputtered Film Evolution Via Real-time/In-situ X-ray Diffraction
J.F. Whitacre, Z.B. Zhao, B.A. Rainey, S.M. Yalisove, J.C. Bilello, University of Michigan |
| 10:20am |
TF-FrM7
In Line Measurement of Ti and TiN Thickness and Optical Constants using Reflectance Data through a Vacuum Chamber Window
M.F. Tabet, Nanometrics Inc., U. Kelkar, Applied Materials |
| 10:40am |
TF-FrM8
Morphology and Growth of Metal Thin Films on Si Probed by In Situ Spectroscopic Ellipsometry@footnote 1@
C. Liu, J. Erdmann, A. Macrander, Argonne National Laboratory |
| 11:00am |
TF-FrM9
Stabilization of High Deposition Rate Reactive Magnetron Sputtering of Oxides by In-Situ Spectroscopic Ellipsometry and Plasma Diagnostics
M. Vergöhl, N. Malkomes, B. Hunsche, B. Szyszka, T. Matthée, Fraunhofer Institute for Surface Engineering and Thin Films, Germany |
| 11:20am |
TF-FrM10
In-situ Structural, Chemical and Electrical Characterization of WO@sub 3@ Sensor Films
S.A. Ding, C.S. Kim, R.J. Lad, University of Maine |
| 11:40am |
TF-FrM11
Growth and In Situ Characterization of Thin Films by a Dual-Plasma System
E.C. Samano, G. Soto, R. Machorro, CCMC-UNAM, Mexico |