AVS 46th International Symposium
    Thin Films Division Friday Sessions
       Session TF-FrM

Paper TF-FrM6
Metallic Sputtered Film Evolution Via Real-time/In-situ X-ray Diffraction

Friday, October 29, 1999, 10:00 am, Room 615

Session: In-situ Characterization and Material Process Imaging
Presenter: S.M. Yalisove, University of Michigan
Authors: J.F. Whitacre, University of Michigan
Z.B. Zhao, University of Michigan
B.A. Rainey, University of Michigan
S.M. Yalisove, University of Michigan
J.C. Bilello, University of Michigan
Correspondent: Click to Email
A laboratory-based in-situ x-ray diffractometer is described. This equipment allows the evolution of sputtered metallic films to be studied during growth. An 18kW rotating anode x-ray source is used in conjunction with an Inel(tm) curvilinear position sensitive detector, which is aligned in the asymmetric or symmetric grazing incidence x-ray scattering (GIXS) geometry. Complete diffraction patterns can be acquired in as little as 2 seconds from films of adequate thickness. The development of texture, stress, grain size, and phase content is observed in coatings consisting of Ta, Cr, and/or CrN. Traditional ex-situ analysis methods are applied to these films after growth and are correlated to the in-situ findings, providing a powerful tool for in-situ process control and optimization. Using this system, films and multilayer coatings can be tailored to have specific microstructural characteristics as they are grown. Data from a number of different experiments will be presented and discussed. This work funded by ARO contracts with numbers DAAH 04-95-1-0120 and 8c DAAG55-98-1-0382.