AVS 46th International Symposium
    Electronic Materials and Processing Division Thursday Sessions

Session EM2-ThA
Silicon Carbide and Dielectrics on Si

Thursday, October 28, 1999, 2:00 pm, Room 611
Moderator: R.M. Feenstra, Carnegie Mellon University


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm EM2-ThA1 Invited Paper
Silicon Carbide: Material of the 21st Century?
P.G. Soukiassian, Université de Paris-Sud/Orsay, France
2:40pm EM2-ThA3
Characterization of PECVD SiC and its Application in Advanced Reticle Technology-SCALPEL Membrane
S. Han, W.J. Dauksher, P.J.S. Mangat, K.D. Cummings, S.M. Smith, Motorola, Inc.
3:00pm EM2-ThA4
Contact Properties of Cerium Ultrathin Film on SiC
W.J. Lu, D.T. Shi, T. Crenshaw, A. Burger, W.E. Collins, Fisk University
3:20pm EM2-ThA5
A Thermodynamic Analysis of Silicide and Carbide Formation and Stability of W, Co, V, and Zr Thin Films on Single-Crystal SiC
W.F. Seng, M.J. Bozack, P.A. Barnes, Auburn University, S.A. Catledge, Y.K. Vohra, University of Alabama at Birmingham
3:40pm EM2-ThA6
Deposition of Yttrium Oxide by Yttrium Sputter/Thermal Oxidation and Reactive Sputtering for Advanced High k Gate Dielectrics
J.J. Chambers, G.N. Parsons, North Carolina State University
4:00pm EM2-ThA7
Bi@sub 4@Ti@sub 3@O@sub 12@ Ferroelectric Thin Films Deposited on Silicon by Pulse Injection Metal-Organic Chemical Vapor Deposition
S.K. Lee, H.J. Kim, Seoul National University, Korea
4:20pm EM2-ThA8
Film-Formation Mechanisms and Step Coverage of (Ba,Sr)TiO@sub 3@ Films Grown by MOCVD
Y. Gao, T.T. Tran, S. Thevuthasan, M.H. Engelhard, Pacific Northwest National Laboratory, P. Alluri, Motorola, Inc.
4:40pm EM2-ThA9
Anhydrous Zirconium (IV) Nitrate as a CVD Precursor for ZrO@sub 2@
R. Smith, N. Hoelien, C. Taylor, T. Ma, S. Campbell, W.L. Gladfelter, J.T. Roberts, University of Minnesota, M. Copel, D.A. Buchanan, IBM T.J. Watson Research Center, M. Gribelyuk, IBM
5:00pm EM2-ThA10
A New Approach for the Fabrication of Device-Quality Ge/GeO@sub 2@/SiO@sub 2@ Interfaces Using Low Temperature Remote Plasma Processing
R.S. Johnson, H. Niimi, G. Lucovsky, North Carolina State University