| AVS 45th International Symposium | |
| Vacuum Metallurgy Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | VM+TF-TuM1 Invited Paper Deposition, Structure, and Properties of Superlattice Thin Films S.A. Barnett, A. Madan, P. Yashar, I. Kim, Northwestern University |
| 9:00am | VM+TF-TuM3 In-situ and Ex-situ Ellipsometric Analysis of Cr, CrN, Cr@sub 2@N Thin Films D.M. Mihut, S.R. Kirkpatrick, S.L. Rohde, University of Nebraska, Lincoln |
| 9:20am | VM+TF-TuM4 AlN/cBN Magnetron Sputtering: Effects on Adhesion and Phase Stabilization W. Otaño, L.J. Pilione, R. Messier, Pennsylvania State University, J.J. Santiago-Avilés, University of Pennsylvania, G. Lamaze, National Institute of Science and Technology |
| 9:40am | VM+TF-TuM5 Invited Paper Energetics of Cubic Boron Nitride Deposition R. Clarke, D. Litvinov, University of Michigan |
| 10:20am | VM+TF-TuM7 Deposition and Characterization of Ultra Thin CNx Films as a Thin-Film Disk Overcoat X. Chu, Z.D. Yang, J.F. Ying, S. Wang, B. Zhang, MMC Technology Inc. |
| 10:40am | VM+TF-TuM8 Carbon and Carbon Nitride Films Prepared by Low-Energy, Isotopically-Mass-Separated, Negative C@sub 2@@super -@ and CN@super -@ Ions N.T. Tsubouchi, A.C. Chayahara, A.K. Kinomura, C.H. Heck, Y.H. Horino, Osaka National Research Institute, AIST, Japan |
| 11:00am | VM+TF-TuM9 Investigation on Multilayered Chemical Vapor Deposited Ti/TiN Films J.C. Hu, National Tsing Hua Univ., Rep. of China, T.C. Chang, National Nano Device Lab, Rep. of China, L.-J. Chen, National Tsing Hua Univ., Rep. of China, Y.L. Yang, National Nano Device Lab, Rep. of China, P.T. Liu, National Chiao Tung Univ., Rep. of China, S.Y. Chen, National Tsing Hua Univ., Rep. of China, C.Y. Chang, National Chiao Tung Univ., Rep. of China |
| 11:20am | VM+TF-TuM10 Chemical Vapor Deposition of Metal (Ti) and Ceramic (TiO@sub 2@, TiN) Thin Films via Gas-Phase Reaction of Titanium Tetrachloride and Sodium Metal Vapor J.H. Hendricks, M.I. Aquino, J.E. Maslar, M.R. Zachariah, National Institute of Standards and Technology |
| 11:40am | VM+TF-TuM11 Low Energy Ion Beam Deposition of Oriented Diamond Microcrystallites P.K. Tse, R.W.M. Kwok, K.M. Lui, W.M. Lau, The Chinese University of Hong Kong |