AVS 45th International Symposium
    Vacuum Metallurgy Division Tuesday Sessions
       Session VM+TF-TuM

Paper VM+TF-TuM3
In-situ and Ex-situ Ellipsometric Analysis of Cr, CrN, Cr@sub 2@N Thin Films

Tuesday, November 3, 1998, 9:00 am, Room 328

Session: Advances in Hard and Superhard Coatings
Presenter: S.L. Rohde, University of Nebraska, Lincoln
Authors: D.M. Mihut, University of Nebraska, Lincoln
S.R. Kirkpatrick, University of Nebraska, Lincoln
S.L. Rohde, University of Nebraska, Lincoln
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Chromium nitride thin films have technological applications in the tool and decorative coating industries, as well as providing an "environmentally-friendly" alternative to hard chrome coatings due to their unique combination of properties such as: low cost, high hardness (1600 - 3000 HK), excellent wear, corrosion, and oxidation resistance (up to 800 °C). An array of chromium and chromium nitride film monolithic and multilayered films were deposited in a ultra-high vacuum chamber equipped with an unbalanced magnetron sputtering system that combines the advantages of high-rate magnetron sputtering with high-flux, low energy ion bombardment. Ellipsometric analysis of the films was carried out by modeling layers of both stoichiometric and off-stoichiometry Cr, CrN and Cr@sub2@N thin films deposited on silicon. The ex-situ ellipsometry measurements were compared with X-ray diffraction measurements, and in-situ obtained ellipsometric information. The optical constants for CrN and Cr@sub2@N obtained using optical ellipsometry are given and compared with the optical constants for CrN and Cr@sub2@N found in the literature, and the potential of using ellipsometry in the monitoring and/or control of ionized PVD processes explored.