AVS 45th International Symposium
    Vacuum Metallurgy Division Tuesday Sessions
       Session VM+TF-TuM

Paper VM+TF-TuM8
Carbon and Carbon Nitride Films Prepared by Low-Energy, Isotopically-Mass-Separated, Negative C@sub 2@@super -@ and CN@super -@ Ions

Tuesday, November 3, 1998, 10:40 am, Room 328

Session: Advances in Hard and Superhard Coatings
Presenter: N.T. Tsubouchi, Osaka National Research Institute, AIST, Japan
Authors: N.T. Tsubouchi, Osaka National Research Institute, AIST, Japan
A.C. Chayahara, Osaka National Research Institute, AIST, Japan
A.K. Kinomura, Osaka National Research Institute, AIST, Japan
C.H. Heck, Osaka National Research Institute, AIST, Japan
Y.H. Horino, Osaka National Research Institute, AIST, Japan
Correspondent: Click to Email
Amorphous carbon (a-C) and carbon nitride (a-CN@sub x@) films were prepared by ion beam deposition using isotopically mass-separated, hyperthermal (50-400 eV) negative ion species such as @super 12@C@sub 2@@super -@ and @super 12@C@super 14@N@super -@ under ultra high vacuum (UHV) condition. Variation of optical constants as a function of ion's kinetic energy was investigated in the infrared-visible light region (0.8-1.5 eV). Optical band gaps of the films were estimated from optical constants. For the amorphous carbon films, the gaps were about 1.0-2.3 eV depending on kinetic energy of negative carbon ions. For the CN films, the values which did not almost depend on kinetic energy were about 0.8 eV.