AVS 45th International Symposium
    Vacuum Metallurgy Division Monday Sessions

Session VM+TF-MoM
Ionized-PVD: Processes, Properties, and Applications

Monday, November 2, 1998, 8:20 am, Room 328
Moderator: S.L. Rohde, University of Nebraska, Lincoln


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Click a paper to see the details. Presenters are shown in bold type.

8:20am VM+TF-MoM1 Invited Paper
Ionised PVD and Filtered Arc Deposition; Processes, Properties and Applications
P.J. Martin, A. Bendavid, CSIRO, Australia, H. Takikawa, Toyohashi University, Japan
9:00am VM+TF-MoM3
Transport of a Cathodic-Arc Plasma Through a Linear-Solenoid Macroparticle Filter
B.P. Cluggish, B.P. Wood, Los Alamos National Laboratory
9:20am VM+TF-MoM4
Characterization of Magnetron-Sputtered Partially Ionized Deposition as a Function of Metal and Gas Species
M.M.C. Allain, D.B. Hayden, D.R. Juliano, D.N. Ruzic, University of Illinois, Urbana-Champaign
9:40am VM+TF-MoM5
Effects of Coil dc Potential on Ion Energy Distribution Measured by an Energy-resolved Mass Spectrometer in Ionized Physical Vapor Deposition
E. Kusano, T. Kobayashi, N. Kikuchi, K. Fukushima, T. Saitoh, S. Saiki, H. Nanto, A. Kinbara, Kanazawa Institute of Technology, Japan
10:00am VM+TF-MoM6
Modeling of Large Cluster Synthesis
A. Hosseini-Tehrani, F.K. Urban III, Florida International University
10:20am VM+TF-MoM7
Combined Monte Carlo and Fluid Sputter Transport Model in an Ionized PVD System with Experimental Plasma Characterization
D.R. Juliano, D.B. Hayden, M.M.C. Allain, D.N. Ruzic, University of Illinois, Urbana
10:40am VM+TF-MoM8
Plasma Diagnostics of Magnetic Field Assisted Ionized Magnetron Sputtering
J.H. Joo, Kunsan National University, Korea
11:00am VM+TF-MoM9
Study of Thin Films Deposited from a Copper Beam Formed in an Argon Atmosphere Capable of Condensing Nanoparticles
F.K. Urban, A. Khabari, A. Housseini-Tehrani, P. Griffiths, G. Fernandez, Florida International University
11:20am VM+TF-MoM10
Novel (111)-Textured AlCu Growth by Ionized Metal Plasma (IMP) Ti Underlayer
J.-B. Lai, L.-J. Chen, National Tsing-Hua University, Republic of China, C.-S. Liu, Taiwan Semiconductor Manufacturing Company, Republic of China
11:40am VM+TF-MoM11
Plasma Polymerization of Fluorine Alloyed Amorphous Carbon Coatings
A. Vanhulsel, J.-P. Celis, KU Leuven, Belgium, E. Dekempeneer, J. Smeets, VITO, Belgium