AVS 45th International Symposium
    Vacuum Metallurgy Division Monday Sessions
       Session VM+TF-MoM

Invited Paper VM+TF-MoM1
Ionised PVD and Filtered Arc Deposition; Processes, Properties and Applications

Monday, November 2, 1998, 8:20 am, Room 328

Session: Ionized-PVD: Processes, Properties, and Applications
Presenter: P.J. Martin, CSIRO, Australia
Authors: P.J. Martin, CSIRO, Australia
A. Bendavid, CSIRO, Australia
H. Takikawa, Toyohashi University, Japan
Correspondent: Click to Email
Recent innovations in vacuum arc deposition have resulted in the development of the filtered arc source as a deposition tool for a range of technologically important materials. The vacuum arc was recognised early on as a potentially useful source of energetic, ionised material and a practical high rate method for depositing thin films with bulk properties and the deposition of new materials. The inherent problem of microdroplet contamination was overcome by several approaches, the toroidal magnetic duct being the most prevalent. The present state of the art of filtered arc deposition (FAD) is discussed in terms of the current understanding of the emitted fluxes, the properties of the materials deposited by these devices and new applications.