AVS 45th International Symposium
    Thin Films Division Wednesday Sessions
       Session TF-WeA

Paper TF-WeA3
Measurements and Modeling of Ti and Ta Sputtering as a Function of Target Microstructure and Temperature

Wednesday, November 4, 1998, 2:40 pm, Room 310

Session: Advances in Sputtering
Presenter: J.P. Allain, University of Illinois, Urbana-Champaign
Authors: J.P. Allain, University of Illinois, Urbana-Champaign
D.A. Alman, University of Illinois, Urbana-Champaign
D.N. Ruzic, University of Illinois, Urbana-Champaign
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The angular distribution of sputtered material and the absolute sputtering yield of metal targets by argon ions at energies less than 1000 eV has been measured in previous work for a number of materials.@footnote 1@ The use of titanium and tantalum films are continually applied as effective underlayers for both barrier and enhanced metallization properties. This paper focuses on the influence of target microstructure and temperature on the sputtering and angular distribution yields. A Colutron ion gun is used to produce an ion beam which is decelerated near the target. The beam diameter near the target is modified so as to focus on a single grain. The beam diameter can also cover several grains including grain boundaries. Grain boundary density and orientation is studied on its effect on the distribution and yield. The diagnostics near the target can be rotated to intercept the sputtered flux. The diagnostics consist of a quartz crystal oscillator to measure total yield and a cylindrical pyrolytic graphite collector plate. The graphite plate is analyzed by an PHI Auger spectrometer to obtain areal densitites and thus the angular distributions. The target assembly is fixed and monitored by a thermocouple. A "cold finger" which can deliver liquid N2 is attached to the target. Modeling of the system is used by an enhanced version of VFTRIM3D, a code which includes fractal geometry and a non-binary collision model.@footnote 2@ @FootnoteText@ @footnote 1@W. Eckstein, C. Garcia-Rosales, J. Roth, W. Ottenberger, "Sputtering Data", pub. Max-Planck-Institut Fur Plasmaphysik, February 1993. @footnote 2@D.N. Ruzic, Nucl. Instrum. Methods B 47 (1990) 118.