| AVS 45th International Symposium | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-ThM1 Invited Paper New Dry Etch Applications for Amorphous TFTs in Flat Panel Displays(FPD) W.W. Yao, dpiX; A Xerox New Enterprise Company |
| 9:00am | TF-ThM3 Field Emission and Photo Emission from Si Micro Tip Arrays Coated with Bias-Grown Diamond Films M.Q. Ding, A.R. Krauss, O. Auciello, D.M. Gruen, T.D. Corrigan, Argonne National Laboratory, M.E. Kordesch, Ohio University, D. Temple, D. Palmer, G.E. McGuire, MCNC |
| 9:20am | TF-ThM4 Hydrogen Concentration Distribution in Plasma Deposited Hydrogenated Amorphous Silicon and Silicon Nitride Films B.F. Hanyaloglu, D.C. Marra, E.S. Aydil, University of California, Santa Barbara |
| 9:40am | TF-ThM5 Invited Paper Poly-Si Thin Film Transistors Fabricated on Low Temperature Plastic Substrates P.G. Carey, P.M. Smith, P. Wickbolt, S.D. Theiss, Lawrence Livermore National Laboratory |
| 10:20am | TF-ThM7 Stability of Very Low Temperature Amorphous Silicon Thin Film Transistors on Flexible Plastic Substrates C.S. Yang, L.L. Smith, C.B. Arthur, G.N. Parsons, North Carolina State University |
| 10:40am | TF-ThM8 Advanced Deposition Technique for Producing Thin Films of Polycrystalline Silicon J.B.O. Caughman, D.B. Beach, G.L. Bell, Oak Ridge National Laboratory |
| 11:00am | TF-ThM9 Polycrystalline Silicon Films Deposited Directly on Glass by Reactive Magnetron Sputtering Using a Microcrystalline Silicon Nucleation Layer D.S. Kim, Samsung Advanced Institute of Technology, Korea, J.E. Gerbi, J.R. Abelson, University of Illinois, Urbana-Champaign |