| AVS 45th International Symposium | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-MoA1 Density Measurements of Cf@sub x@ in a GEC Reference Cell by Infrared Absorption I.C. Abraham, R.C. Woods, University of Wisconsin, Madison, G.A. Hebner, Sandia National Laboratories |
| 2:20pm | PS2-MoA2 Un-Collided Beam Mass Spectrometric Measurements in C@sub 2@F@sub 6@ and CHF@sub 3@ Dielectric Etch Discharges J. RaviPrakash, R.C. McGrath, The Pennsylvania State University, G.A. Hebner, Sandia National Laboratories |
| 2:40pm | PS2-MoA3 Modeling High-Density Plasma Etching of Aluminum and Photoresist@footnote 1@ P. Ho, E. Meeks, A. Ting, S.J. Choi, Sandia National Laboratories |
| 3:00pm | PS2-MoA4 Studies of Ion Bombardment in Plasma Cleaning and Etching Gases J.K. Olthoff, Y. Wang, National Institute of Standards and Technology |
| 3:20pm | PS2-MoA5 Diode Laser Measurements of CF@sub x@ and CO Radicals in an Inductively Coupled GEC Reference Cell G.P. Deering, W.L. Perry, H.M. Anderson, University of New Mexico |
| 3:40pm | PS2-MoA6 Cavity Ring Down Spectroscopy on an expanding Ar/C@sub 2@H@sub 2@ Plasma A.H.M. Smets, K.G.Y. Letourneur, M.G.H. Boogaarts, M.C.M. van de Sanden, D.C. Schram, Eindhoven University of Technology, The Netherlands |
| 4:00pm | PS2-MoA7 VUV-Visible Emission Spectroscopy Investigation of Frequency Effects in Low Pressure Plasmas A.C. Fozza, École Polytechnique, Canada, M. Moisan, Université de Montréal, Canada, M.R. Wertheimer, École Polytechnique, Canada |
| 4:20pm | PS2-MoA8 Plasma Sheath Electric Field Strengths Above a Grooved Electrode in a Parallel-Plate Radio Frequency Discharge U. Czarnetzki, Universitaet GH Essen, Germany, G.A. Hebner, Sandia National Laboratories, D. Luggenholscher, H.F. Dobele, Universitaet GH Essen, Germany, M.E. Riley, Sandia National Laboratories |
| 4:40pm | PS2-MoA9 Ultrahigh Frequency vs. Inductively-Coupled Chlorine Plasmas: Comparisons of Cl and Cl@sub 2@ Concentrations and Electron Temperatures Measured by Trace Rare Gases Optical Emission Spectroscopy V.M. Donnelly, M.V. Malyshev*, Bell Laboratories, Lucent Technologies, S. Samukawa, NEC Corporation, Japan |
| 5:00pm | PS2-MoA10 Spectroscopic Measurements in an Inductively Coupled RF Discharge in Hydrogen@footnote 1@ M.L. Huebschman, R.D. Bengtson, J.C. Wiley, J.G. Ekerdt, University of Texas, Austin, V. Bakshi, International Sematech |