AVS 45th International Symposium
    Partial Pressure Measurements and Process Control Topical Conference Thursday Sessions

Session PC-ThA
RGA Characteristics and Calibration

Thursday, November 5, 1998, 2:00 pm, Room 317
Moderator: S.A. Tison, Millipore Corporation


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PC-ThA1 Invited Paper
Semiconductor Applications of a Quadrupole Mass Spectrometer
R.K. Waits, MKS Instruments
2:40pm PC-ThA3 Invited Paper
In Situ Monitoring of Semiconductor Reactive Gas Processes using Partial Pressure Analyzers
L.C. Frees, Leybold Inficon, Inc.
3:20pm PC-ThA5
Emission Free Measurement of Residual Gas in XHV Using Ionization by Trapped Electrons in Magnetic Field
A. Yamamoto, S. Kato, KEK, Japan
3:40pm PC-ThA6
Residual Gas Analyzer Ion Current Measurement, Calibration and Partial Pressure Detection Limits
R.E. Ellefson, A.J. Kubis, L.C. Frees, Leybold Inficon, Inc.
4:00pm PC-ThA7 Invited Paper
Practical Quadrupole Theory: RGA Characteristics
R.E. Pedder, ABB Extrel
4:40pm PC-ThA9
Residual Gas Analyzer Performance Characteristics
C.R. Tilford, National Institute of Standards and Technology, T. Gougousi, University of Maryland
5:00pm PC-ThA10
Calibration of Gas-Analytic Mass Spectrometers for Gases and Vapors
R. Dobrozemsky, G.W. Schwarzinger, Vienna University of Technology, Austria