| AVS 45th International Symposium | |
| Nanometer-scale Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | NS-ThM1 Fabrication of Nanometer Size Photoresist Wire Patterns with a Silver Nanocrystal Shadowmask S. Choi, K.L. Wang, University of California, Los Angeles, M. Leung, G. Stupian, N. Presser, The Aerospace Corporation, S. Chung, G. Markovich, S. Kim, J.R. Heath, University of California, Los Angeles |
| 8:40am | NS-ThM2 Fabrication and Structuring of Ordered Two-Dimensional Nanopore Arrays in Anodic Alumina A.P. Li, F. Mueller, A. Birner, K. Nielsch, U.M. Goesele, Max-Planck-Institute of Microstructure Physics, Germany |
| 9:00am | NS-ThM3 Chemically Assisted Ion-Beam Etching of Submicrometer Features in GaSb-based Quantum Wells G. Nagy, R.U. Ahmad, M. Levy, R.M. Osgood, Jr., Columbia University, M.J. Manfra, G.W. Turner, Massachusetts Institute of Technology |
| 9:20am | NS-ThM4 Nanometer-scale Sputter-Induced Rippling of the SiO@sub2@ Surface Characterized with Real-Time X-ray Scattering C.C. Umbach, Cornell University, R.L. Headrick, Cornell High Energy Synchrotron Source, B.H. Cooper, J.M. Blakely, Cornell University, E. Chason, Sandia National Laboratories |
| 9:40am | NS-ThM5 Materials Considerations for Optical Lithography at the Nanometer Scale F.A. Houle, W.D. Hinsberg, M.I. Sanchez, J. Hoffnagle, M. Morrison, C. Nguyen, IBM Almaden Research Center |
| 10:00am | NS-ThM6 Nanofabrication of Organic Thin Film Materials Using Scanning Probe Lithography G. Liu, S. Xu, K. Wadu-Mesthrige, Y. Qian, Wayne State University |
| 10:20am | NS-ThM7 Proximity X-ray Lithography of Siloxane and Polymer Films Containing Benzyl Chloride Functional Groups S.L. Brandow, W.J. Dressick, C.S. Dulcey, Naval Research Laboratory, H. Witschi, P.F. Nealey, University of Wisconsin |
| 10:40am | NS-ThM8 Nanofabrication of Apertures for Single Quantum Dot Spectroscopy D. Park, C.R.K. Marrian, D. Gammon, R. Bass, P. Isaacson, E. Snow, Naval Research Laboratory |
| 11:00am | NS-ThM9 Nanolithography and Macromolecular PMMA E.A. Dobisz, S.L. Brandow, R. Bass, L.M. Shirey, Naval Research Laboratory |
| 11:20am | NS-ThM10 Indium Phosphide Nanocrystals formed by Sequential Ion Implantation into Fused Silica D.O. Henderson, R. Mu, A. Ueda, M.H. Wu, D. Denmark, Fisk University, C.W. White, A. Meldrum, R.A. Zuhr, Oak Ridge National Laboratory |