AVS 45th International Symposium
    Nanometer-scale Science and Technology Division Thursday Sessions
       Session NS-ThM

Paper NS-ThM7
Proximity X-ray Lithography of Siloxane and Polymer Films Containing Benzyl Chloride Functional Groups

Thursday, November 5, 1998, 10:20 am, Room 321/322/323

Session: Nanoscale Patterning and Modification
Presenter: S.L. Brandow, Naval Research Laboratory
Authors: S.L. Brandow, Naval Research Laboratory
W.J. Dressick, Naval Research Laboratory
C.S. Dulcey, Naval Research Laboratory
H. Witschi, University of Wisconsin
P.F. Nealey, University of Wisconsin
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Siloxane and polymer films containing benzyl chloride functional groups were exposed to patterned proximity x-rays. Silicon wafers coated with films of (p-chloromethyl)phenyl-trichlorosilane (CMPTS) or spun coated poly-vinyl benzyl chloride (PVBC) were exposed at the University of Wisconsin synchrotron x-ray source using 0.9385 nm radiation (800 MeV) at doses ranging from 50-1500 mJ/cm@super2@. Exposure resulted in changes to the surface energy and chemical reactivity of the imaging layers. The loss of chlorine and formation of oxidized carbon photoproducts upon exposure was followed as a function of dose using x-ray photoelectron spectroscopy. A corresponding change in surface energy, as monitored by static water contact angle, was also observed. The successful chemical grafting of amine ligands to the portions of the siloxane and polymer films which have been exposed to proximity x-rays definitively establishes the formation of surface aldehyde or ketone groups as a major photochemical pathway. The resulting surface amine was used to covalently bind either a fluorescent tag or a colloidal Pd(II) nanoparticle capable of initiating the deposition of electroless Ni. Pattern formation is demonstrated and the mechanistic differences of photoproduct formation on siloxane and polymer films will be discussed.