| AVS 45th International Symposium | |
| Manufacturing Science and Technology Group | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | MS-TuM1 Invited Paper Reaction/Annealing Pathways for Forming Ultrathin Silicon Nitride Films for Composite Oxide-Nitride Gate Dielectrics with Nitrided Crystalline Silicon-Dielectric Interfaces for Application in Advanced CMOS Devices G. Lucovsky, North Carolina State University |
| 9:00am | MS-TuM3 Invited Paper Process Mixing in Cluster Tools R.A. Powell, Novellus Systems |
| 9:40am | MS-TuM5 Invited Paper Process Integration Overview: Development and High Volume Manufacturing of Microprocessor Products R.A. Gasser, Jr, Intel Corporation |
| 10:20am | MS-TuM7 Invited Paper Value Chain Integration P.S. Peercy, SEMI/SEMATECH |
| 11:00am | MS-TuM9 Invited Paper Factory Integration in the NTRS: Future Factory Level Issues and Needs G.M. Gettel, SEMATECH / Texas Instruments, Inc. |