AVS 45th International Symposium
    Magnetic Interfaces and Nanostructures Technical Group Wednesday Sessions
       Session MI+EM-WeM

Invited Paper MI+EM-WeM7
Deposition and Processing of Novel GMR Structures @footnote 1@

Wednesday, November 4, 1998, 10:20 am, Room 324/325

Session: Spin-dependent Devices: Technology and Processing
Presenter: J.R. Childress, University of Florida, Gainesville
Correspondent: Click to Email
Optimized GMR devices may require the development of magnetic multilayer film structures combining binary and ternary alloys, composition gradients, composites, and metal/insulator interfaces. The structural and magnetic optimization of individual components within these multilayers often require specialized deposition and/or processing parameters which may be mutually incompatible, or incompatible with other necessary processing. Additionally, the interfacial structural and magnetic properties of alloys may be different from bulk, further complicating the interpretation of experimental data. Several current examples and experimental approaches will be discussed, such as the development of 100% spin-polarized magnetic films using NiMnSb and other compounds, metallic and insulating antiferromagnets for exchange biasing, and metal/insulator interfaces. @FootnoteText@ @footnote 1@ Author present address: IBM Almaden Research Center, 650 Harry Rd, San Jose, CA 95120