| AVS 45th International Symposium | |
| Electronic Materials and Processing Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | EM1-ThA1 Short Range Order and Electronic Structure of Amorphous Silicon Oxinitride V.A. Gritsenko, Siberian Branch of Russian Academy of Science, R.W.M. Kwok, Y.H. Ng, J.B. Xu, I.H. Wilson, The Chinese University of Hong Kong |
| 2:20pm | EM1-ThA2 Cathodoluminescence Spectroscopy of Nitrided Si-SiO@sub 2@ Interfaces R. Bandhu, J. Schäfer, A.P. Young, L.J. Brillson, The Ohio State University, H. Niimi, G. Lucovsky, North Carolina State University |
| 2:40pm | EM1-ThA3 Reliability of Ultra-thin Gate Dielectric formed with Nitrogen Implantation and Thermal Oxidation Y. Ma, M.S. Carroll, F. Li, C.T. Liu, C.Y. Sung, M.M. Brown, Bell Laboratories, Lucent Technologies |
| 3:00pm | EM1-ThA4 Effect of Substrate Temperature in SiO@sub x@N@sub y@ Films Deposited By Electron Cyclotron Resonance A. del Prado, F.L. Martinez, Universidad Complutense de Madrid, Spain, M. Fernandez, Instituto de Ciencia de Materiales, Spain, I. Martil, G. Gonzalez Diaz, Universidad Complutense de Madrid, Spain |
| 3:20pm | EM1-ThA5 Invited Paper Roughness at Si/SiO@sub 2@ Interfaces and Silicon Oxidation X. Chen, Argonne National Laboratory, J.M. Gibson, University of Illinois, Urbana |
| 4:00pm | EM1-ThA7 Energy Dispersion of the Conduction Band Mass in Ultrathin SiO@sub 2@ Gate Oxides R. Ludeke, IBM T.J. Watson Research Center, A. Schenk, Swiss Federal Institute of Technology, Switzerland |
| 4:20pm | EM1-ThA8 Ultra Thin Silicon Oxide Film on Si(100) Fabricated by High Purity Ozone at Atmospheric Pressure K. Nakamura, S. Ichimura, A. Kurokawa, Electrotechnical Laboratory, Japan, K. Koike, G. Inoue, T. Fukuda, Iwatani International Corporation, Japan |
| 4:40pm | EM1-ThA9 Mixed Silicon Dioxide / Tantalum Oxide Layers for High k MOS Gate Dielectrics Formed by Plasma Oxidation of Si and Ta Using a rf Remote N@sub 2@O Plasma Source J.J. Chambers, G. Lucovsky, G.N. Parsons, North Carolina State University |
| 5:00pm | EM1-ThA10 Thermal Stability of a-SiNx:H Films Deposited by Plasma Electron Cyclotron Resonance F.L. Martinez, A. del Prado, Universidad Complutense de Madrid, Spain, D. Bravo, F.J. Lopez, Universidad Autonoma de Madrid, Spain, I. Martil, G. Gonzalez-Diaz, Universidad Complutense de Madrid, Spain |