AVS 45th International Symposium
    Electronic Materials and Processing Division Friday Sessions

Session EM-FrM
Fabrication and Characterization of Semiconductor Device Layers

Friday, November 6, 1998, 8:20 am, Room 316
Moderator: A. Bensaoula, University of Houston


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am EM-FrM1
Optical, Structural, and Morphological Properties of Epitaxial Al@sub x@Ga@sub (1-x)@N(0001) Films Grown by Gas-Source Molecular Beam Epitaxy
J.E. Van Nostrand, Air Force Research Laboratory, R.L. Hengehold, Air Force Institute of Technology, K.D. Leedy, M.L. Seaford, D.H. Tomich, C.E. Stutz, Q.-H. Xie, Air Force Research Laboratory
8:40am EM-FrM2
Investigation of High Temperature Characteristics of Metal-Insulator-Semiconductor Diode Structures Fabricated Using BN Layers Grown on GaN and SiC
D. Starikov, N. Badi, I. Berichev, N. Medelci, A. Tempez, V. Zomorrodian, A. Bensaoula, University of Houston
9:00am EM-FrM3
Chemical Beam Epitaxy of GaAsN on GaAs (100)
J.W. Rogers, Jr., C.L. Aardahl, H.K. Yun, T.P. Pearsall, University of Washington
9:20am EM-FrM4
InP Photocathode Surface Preparation by Atomic Hydrogen Cleaning
K.A. Elamrawi, M.A. Hafez, H. Elsayed-Ali, Old Dominion University
9:40am EM-FrM5
Deposition and Electroluminescent Properties of Sputter Deposited Zn(x)Mg(1-x)S:Mn
M.R. Davidson, K.E. Waldrip, J.S. Lewis, D. Moorehead, B. Speck, P.H. Holloway, University of Florida, Gainesville, S.S. Sun, Planar Systems, Inc.
10:00am EM-FrM6
Small Area XPS Analysis of Silicon Wafers Employing Cu Line Technology
E. Principe, R. Brigham, T.J. Schuerlein, Charles Evans & Associates
10:20am EM-FrM7
Epitaxial Ferroelectric Ba@sub (1-x)@Sr@sub x@TiO@sub 3@ Thin Films for Tunable Microwave Devices
C.L. Chen, F.F. Feng, Z.H. Zhang, A. Brazdeikis, University of Houston, F.A. Miranda, Lewis Research Center, Y. Liou, W.K. Chu, C.W. Chu, University of Houston
10:40am EM-FrM8
Reaction Pathways/Energetics for Chemical Attack of Amorphous Si-O-F and C-F-(H,OH) Low-k Dielectric Thin Films by Water Molecules
H. Yang, G. Lucovsky, North Carolina State University
11:00am EM-FrM9
Carbon Incorporation in SiGeC Alloys Grown by UHV/CVD
A.C. Mocuta, D.W. Greve, Carnegie Mellon University
11:20am EM-FrM10
XPS Study of the Role of Ti and TiN Caps on the Cobalt / SiO@sub 2@ Interface
T. Conard, IMEC, MAPFCA, Belgium, E. Kondoh, W. Vandervorst, IMEC, Belgium