| AVS 45th International Symposium | |
| Applied Surface Science Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | AS-TuM1 Using a Focused Beam XPS System for Analysis of Oxides, Insulators and Beam Sensitive Materials@footnote 1@ M.H. Engelhard, L.-Q. Wang, B.J. Tarasevich, D.R. Baer, Pacific Northwest National Laboratory |
| 8:40am | AS-TuM2 Implementation and Application of a Ag L@sub alpha@ Monochromatic Source on a Magnetic Lens Based Spectrometer C.J. Blomfield, B.J. Tielsch, S.P. Page, Kratos Analytical Ltd, United Kingdom |
| 9:00am | AS-TuM3 The Good and the Bad About XPS Peak Fitting N.H. Turner, Naval Research Laboratory |
| 9:20am | AS-TuM4 Auger Depth Profiling at Extreme Low Ion Energy M. Menyhard, A. Barna, A. Sulyok, Research Institute for Technical Physics and Materials Science, Hungary |
| 9:40am | AS-TuM5 Invited Paper Sample Preparation and Practical Surface (and Interface) AnalysisTricks of the Trade D.F. Reich, Physical Electronics |
| 10:20am | AS-TuM7 Physical Influences on Chemical Identification using TOF-SIMS T.J. Schuerlein, G.S. Strossman, K.J. Wu, T.F. Fister, Charles Evans & Associates |
| 10:40am | AS-TuM8 SEM Sample Preparation Using Ion Sputtering J.R. Kingsley, X. Lu, Charles Evans & Associates |
| 11:00am | AS-TuM9 The Correlation Between Ion Beam/Material Interactions and Practical FIB Specimen Preparation B.I. Prenitzer, L.A. Giannuzzi, University of Central Florida, S.R. Brown, Cirent Semiconductor, T.L. Shofner, Bartech Group, R.B. Irwin, F.A. Stevie, Cirent Semiconductor |
| 11:20am | AS-TuM10 Use of Micro-Craters and Extended Rotational Profiling for Auger Analysis of Difficult Samples R.E. Davis, IBM Corporation, East Fishkill Facility |
| 11:40am | AS-TuM11 Two-Dimensional Surface Roughness Measurements of Sidewalls of High Aspect Ratio Patterns Using the Atomic Force Microscope K.-J. Chao, R.J. Plano, J.R. Kingsley, Charles Evans & Associates |