In a plasma the local charging voltage of a floating structure is controlled by the difference in local electron and ion fluxes, the local capacitance and the feedback of the developed voltage on the local plasma sheath, which controls the electron current. Any additional discharging current paths will also affect the charging voltage and subsequent device damage. One such current path which is poorly understood is UV induced photoconductivity in dielectrics. Among of the problems in understanding this discharging path has been the difficulty in measuring dielectric conduction in a plasma and in separating charging from UV effects. In his work a very low density plasma was used to induced charging up to 20 V while a separate high density plasma separated by a thin filter/window was used to generate the vacuum UV. For monitoring charging a bare SPORT charging probes were used, and to monitor photoconductivity oxide covered probes were used. Conductivity which deceased linearly with the UV source power was observed. In addition, the conductivity deceased with 1/ oxide thickness squared. Finally, by using different filters it was concluded that VUV near the oxide band gap of ~9 eV was causing the conductivity. All these observations are consistent classic bulk induced photoconductivity. The implications of this dielectric conductivity on charging and related damage will be discussed.