| AVS 64th International Symposium & Exhibition | |
| Manufacturing Science and Technology Group | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | MS+AS-WeA1 Invited Paper The Cornell High Energy Synchrotron Source Upgrade: Current and Future Capabilities for Thin-film Research Arthur Woll, Cornell University |
| 3:00pm | MS+AS-WeA3 Invited Paper Using Synchrotron XRD Techniques to Impact Microelectronics Manufacturing Technologies Jean Jordan-Sweet, C. Lavoie, IBM T.J. Watson Research Center, A.V. Carr, IBM Research, Albany, NY, N. Breil, IBM SRDC, East Fishkill; now with Applied Materials Inc., M.M. Frank, IBM T.J. Watson Research Center |
| 4:20pm | MS+AS-WeA7 Invited Paper Development of Ultra-thin ALD Grown high-k Dielectrics and Interconnect Diffusion Barrier Layers aided by Advanced X-ray Structural Analysis for sub 10nm Nodes Steven Consiglio, K. Tapily, R.D. Clark, C.S. Wajda, K.-H. Yu, T. Hakamata, G.J. Leusink, TEL Technology Center, America, LLC, S. Dey, A.C. Diebold, Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute |
| 5:00pm | MS+AS-WeA9 Stress Control of rf Sputter Deposition of Piezoelectric Sc0.12Al0.88N Michael Henry, R.P. Timon, T.R. Young, E.A. Douglas, B. Griffin, Sandia National Laboratories |