| AVS 62nd International Symposium & Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | SE+PS-TuA1 Strategy for Tuning the Average Charge State of Metal Ions Incident at the Growing Film during HIPIMS Deposition Grzegorz Greczynski, Linköping University, Sweden, I. Petrov, University of Illinois at Urbana Champaign, J.E. Greene, University of Illinois at Urbana-Champaign, L. Hultman, Linköping University, Sweden |
| 2:40pm | SE+PS-TuA2 Study of High Power Pulsed Magnetron Sputtering Under Differing Magnetic Field Configurations Priya Raman, I.A. Shchelkanov, J.T. McLain, University of Illinois at Urbana Champaign, S. Armstrong, Kurt J. Lesker Company, D.N. Ruzic, University of Illinois at Urbana Champaign |
| 3:00pm | SE+PS-TuA3 Invited Paper Reactive High-power Impulse Magnetron Sputtering and Pulsed Magnetron Co-sputtering of Multifunctional Films Jaroslav Vlcek, J.R. Rezek, P.M. Mares, University of West Bohemia, Czech Republic |
| 4:20pm | SE+PS-TuA7 Target Poisoning in Mixed Ar, N2 and CH4 Atmosphere, in Processes Using Different Target Materials for HIPIMS/DC and DC Cathode Modes. Anna Oniszczuk, A.P. Ehiasarian, Sheffield Hallam University, United Kingdom of Great Britain and Northern Ireland, C.F. Carlström, M. Ahlgren, Sandvik Coromant, Sweden |
| 4:40pm | SE+PS-TuA8 Structure and Properties of Cr2O3 Coatings Deposited using DCMS, PDCMS, and DOMS Jianliang Lin, Southwest Research Institute, W.D. Sproul, Reactive Sputtering, Inc. |
| 5:00pm | SE+PS-TuA9 Strategy to Tailor the Composition of Silicon Oxynitride Thin Films Deposited by Reactive High Power Impulse Magnetron Sputtering using Nitrous Oxide as a Single-source Precursor Tuomas Hänninen, S. Schmidt, J. Jensen, L. Hultman, H. Högberg, Linköping University, Sweden |
| 5:20pm | SE+PS-TuA10 Phase Changes Observed on AlCr Composite Cathodes due to the Exposure to Cathodic Arc Plasmas in N2 and O2 Atmospheres Robert Franz, F. Mendez Martin, G. Hawranek, Montanuniversität Leoben, Austria, P. Polcik, PLANSEE Composite Materials GmbH, Germany |
| 5:40pm | SE+PS-TuA11 Optimization of Linear Scanning Magnetron Array Performance Vladimir Kudriavtsev, A. Riposan, D.W. Brown, C. Smith, T. Bluck, Intevac, Inc. |
| 6:00pm | SE+PS-TuA12 Correlation of Microstructure of Deposited Thin Films with Discharge Characteristics by Modulated Pulsed Power Magnetron Sputtering (MPPMS) M.K. Lei, Dalian University of Technology, China |