AVS 62nd International Symposium & Exhibition | |
Advanced Surface Engineering | Tuesday Sessions |
Session SE+PS-TuA |
Session: | Pulsed Plasmas in Surface Engineering |
Presenter: | Jianliang Lin, Southwest Research Institute |
Authors: | J. Lin, Southwest Research Institute W.D. Sproul, Reactive Sputtering, Inc. |
Correspondent: | Click to Email |
The properties of oxide coatings are strongly tied to the crystallinity of oxide phases. In general, a well-crystallized oxide phase is desired because it is usually related to improved mechanical and chemical properties. This paper presents a comparative study of the chromium oxide (Cr2O3) coatings deposited by deep oscillation magnetron sputtering (DOMS), mid-frequency pulsed dc magnetron sputtering (PDCMS) and continuous dc magnetron sputtering (DCMS). Without applying external substrate heating, the processing techniques strongly affected the crystallinity of the Cr2O3 coatings. The DCMS-Cr2O3 coating exhibited an amorphous like structure. The coating deposited by PDCMS contained a mixture of amorphous and crystalline phases. In contrast, the DOMS-Cr2O3 coating showed a strong crystallinity with a (110) preferential orientation. The improved crystallinity of the DOMS-Cr2O3 coating is due to the higher ion bombardment and higher substrate saturation temperature, which is related to the high energy electron bombardment associated with deep oscillation pulses. Improved mechanical properties and wear resistance were achieved in the DOMS-Cr2O3 coatings as compared to the coatings deposited using DCMS and PDCMS. This study also showed that the bias voltage strongly affected the structure of the DOMS-Cr2O3 coatings by changing the substrate current characteristics.