AVS 62nd International Symposium & Exhibition
    Plasma Science and Technology Thursday Sessions

Session PS-ThA
Plasma Sources

Thursday, October 22, 2015, 2:20 pm, Room 210A
Moderator: Cheng-Che Hsu, National Taiwan University


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Click a paper to see the details. Presenters are shown in bold type.

2:20pm PS-ThA1
Control of Electron Heating and Ion Energy Distributions in Capacitive Plasmas by Voltage Waveform Tailoring based on a Novel Power Supply and Impedance Matching
Birk Berger, J. Franek, St. Brandt, West Virginia University, M. Liese, M. Barthel, Barthel HF-Technik GmbH, Germany, E. Schuengel, M. Koepke, J. Schulze, West Virginia University
2:40pm PS-ThA2
Spectroscopic and Beam Current Characterisation of an RF Excited Argon Plasma Cathode Electron Beam Gun for Material Processing Applications
Sofia del Pozo, TWI Ltd. and Brunel University, United Kingdom of Great Britain and Northern Ireland, C.N. Ribton, TWI Ltd., United Kingdom of Great Britain and Northern Ireland, D.R. Smith, Brunel University
3:00pm PS-ThA3 Invited Paper
Around the World of RF-Plasma Generation: A Brief Tour in 80 (half) Minutes
Neil Benjamin, Lam Research Corporation
4:00pm PS-ThA6
Electron Beam Generated Plasmas Produced in Fluorine-Containing Gases: Characterization of Plasma-Surface Interactions
Scott Walton, D.R. Boris, US Naval Research Laboratory, R.F. Fernsler, Sotera Defense Solutions, Inc., S.C. Hernández, Tz.B. Petrova, G.M. Petrov, US Naval Research Laboratory
4:20pm PS-ThA7
Electron Beam Generated Plasmas Produced in Fluorine-Containing Gases: Characterizing Plasma Parameters
David Boris, G.M. Petrov, Naval Research Laboratory, R.F. Fernsler, Sotera Defense Solutions, Tz.B. Petrova, S.G. Walton, Naval Research Laboratory
4:40pm PS-ThA8 Invited Paper
Microwave Plasma Source Technologies: A Fifty Year Evolution from Unwanted Discharges to Free Radical Sources, to Low Pressure and Temperature Plasma Processing, to Gem Quality Diamond Synthesis
Jes Asmussen, Michigan State University
5:20pm PS-ThA10
Insights to Scaling Remote Plasma Sources Sustained in NF3 Mixtures
Shuo Huang, University of Michigan, V. Volynets, S. Lee, I.-C. Song, S. Lu, Samsung Electronics Co., Ltd., Republic of Korea, J.R. Hamilton, J. Tennyson, University College London, UK, M.J. Kushner, University of Michigan