AVS 62nd International Symposium & Exhibition | |
Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | PS-ThA1 Control of Electron Heating and Ion Energy Distributions in Capacitive Plasmas by Voltage Waveform Tailoring based on a Novel Power Supply and Impedance Matching Birk Berger, J. Franek, St. Brandt, West Virginia University, M. Liese, M. Barthel, Barthel HF-Technik GmbH, Germany, E. Schuengel, M. Koepke, J. Schulze, West Virginia University |
2:40pm | PS-ThA2 Spectroscopic and Beam Current Characterisation of an RF Excited Argon Plasma Cathode Electron Beam Gun for Material Processing Applications Sofia del Pozo, TWI Ltd. and Brunel University, United Kingdom of Great Britain and Northern Ireland, C.N. Ribton, TWI Ltd., United Kingdom of Great Britain and Northern Ireland, D.R. Smith, Brunel University |
3:00pm | PS-ThA3 Invited Paper Around the World of RF-Plasma Generation: A Brief Tour in 80 (half) Minutes Neil Benjamin, Lam Research Corporation |
4:00pm | PS-ThA6 Electron Beam Generated Plasmas Produced in Fluorine-Containing Gases: Characterization of Plasma-Surface Interactions Scott Walton, D.R. Boris, US Naval Research Laboratory, R.F. Fernsler, Sotera Defense Solutions, Inc., S.C. Hernández, Tz.B. Petrova, G.M. Petrov, US Naval Research Laboratory |
4:20pm | PS-ThA7 Electron Beam Generated Plasmas Produced in Fluorine-Containing Gases: Characterizing Plasma Parameters David Boris, G.M. Petrov, Naval Research Laboratory, R.F. Fernsler, Sotera Defense Solutions, Tz.B. Petrova, S.G. Walton, Naval Research Laboratory |
4:40pm | PS-ThA8 Invited Paper Microwave Plasma Source Technologies: A Fifty Year Evolution from Unwanted Discharges to Free Radical Sources, to Low Pressure and Temperature Plasma Processing, to Gem Quality Diamond Synthesis Jes Asmussen, Michigan State University |
5:20pm | PS-ThA10 Insights to Scaling Remote Plasma Sources Sustained in NF3 Mixtures Shuo Huang, University of Michigan, V. Volynets, S. Lee, I.-C. Song, S. Lu, Samsung Electronics Co., Ltd., Republic of Korea, J.R. Hamilton, J. Tennyson, University College London, UK, M.J. Kushner, University of Michigan |