| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThA |
| Session: | Plasma Sources |
| Presenter: | David Boris, Naval Research Laboratory |
| Authors: | D.R. Boris, Naval Research Laboratory G.M. Petrov, Naval Research Laboratory R.F. Fernsler, Sotera Defense Solutions Tz.B. Petrova, Naval Research Laboratory S.G. Walton, Naval Research Laboratory |
| Correspondent: | Click to Email |
Electron beam generated plasmas are characterized by high plasma density (>1010 cm-3), and very low electron temperatures (<1 eV) making them well suited to next generation processing techniques where high fluxes of low energy ions are desired. In this work, we focus on the characteristics these plasmas in fluorine containing chemistries (SF6, CxFy), due to their relevance to industrial etching applications. In particular we focus on the effect of dilute fluorine gas mixtures on the electron density, total plasma density, electronegativity, and electron temperature. These parameters are measured using a suite of probes, with plasma parameters calculated using an NRL developed Langmuir probe model which is particularly useful in complex multi-component plasmas. The results are then compared with a one-dimensional steady-state hydrodynamic model of electron beam generated Ar-SF6 plasmas at low pressure in a constant magnetic field.
This work supported by the Naval Research Laboratory Base Program