AVS 61st International Symposium & Exhibition
    Plasma Science and Technology Tuesday Sessions

Session PS-TuM
Plasma Surface Interactions I

Tuesday, November 11, 2014, 8:00 am, Room 308
Moderator: Jane P. Chang, University of California at Los Angeles


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am PS-TuM1 Invited Paper
Directed Irradiation Synthesis: Manipulating Matter in Nanoscale Self-Organized Systems
Jean Paul Allain, Z. Koyn, B. Holybee, S. Arias, University of Illinois at Urbana-Champaign
8:40am PS-TuM3
Contact Resistance Degradation Caused By Plasma Charging of Silicon on Insulator During Contact Etch
Todd Bauer, J.F. DiGregorio, R.L. Jarecki Jr., Sandia National Laboratories
9:00am PS-TuM4
3D Modeling of SiN Etching by Hydrofluorocarbon Plasma
Nobuyuki Kuboi, T. Tatsumi, T. Kinoshita, T. Shigetoshi, M. Fukasawa, J. Komachi, H. Ansai, Sony Corporation, Japan
9:20am PS-TuM5
Study of Plasma-Surface Interaction in HBr/Cl2/O2 ICP
Ashutosh Srivastava, University of Houston, T. Ohashi, Hitachi High-Technologies, V.M. Donnelly, University of Houston
9:40am PS-TuM6
Experimental Evaluation of Ta Film Etching Characteristics by CO+ Ion Irradiation
Makoto Satake, Hitachi, Japan, H. Li, K. Karahashi, S. Hamaguchi, Osaka University, Japan
11:00am PS-TuM10
Study of Hydrofluorocarbon Precursor Parameters for Plasma Etching of ULK Dielectric
Chen Li, G.S. Oehrlein, University of Maryland, College Park, R. Gupta, V. Pallem, Air Liquide
11:20am PS-TuM11
Characteristics of Reactive Ion Etching Processes for ITO and ZnO
Hu Li, K. Karahashi, Osaka University, Japan, M. Fukasawa, K. Nagahata, T. Tatsumi, Sony Corporation, Japan, S. Hamaguchi, Osaka University, Japan
11:40am PS-TuM12
Selective Etch and Functionalization of Coblock Polymers
Evgeniya Lock, S.G. Walton, Naval Research Laboratory
12:00pm PS-TuM13
Dry Etch Process Development for PMMA Removal Selectively to PS for sub-10nm Patterning
Aurelien Sarrazin, P. Pimenta-Barros, N. Posseme, S. Barnola, A. Gharbi, R. Tiron, CEA, LETI, MINATEC Campus, France, C. Cardinaud, CNRS-IMN, France