| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:40am | PS2+PV-MoM2 Plasma Etching and Texturing of Multi-Crystalline for Silicon Solar Cells using Remote-Type Pin-To-Plate Dielectric Barrier Discharge J.B. Park, J.S. Oh, E.L. Gil, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| 9:00am | PS2+PV-MoM3 Production of Crystalline Si Nanoparticles for Third Generation Photovoltaics using a Multi-Hollow Discharge Plasma CVD Method Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Kyushu University, Japan, M. Kondo, AIST, Japan |
| 9:20am | PS2+PV-MoM4 Novel Model-Based Sensor for Thin Film Deposition on Large Area Substrates M. Klick, Plasmetrex, Germany, L. Eichhorn, R. Rothe, Plasmetrex |
| 9:40am | PS2+PV-MoM5 Invited Paper Plasma Processing of Thin Silicon Films for Photovoltaic Applications A.H.M. Smets, National Institute of Advanced Industrial Science and Technology, Japan and Eindhoven University of Technology, Netherlands, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands, T. Matsui, M. Kondo, National Institute of Advanced Industrial Science and Technology, Japan |
| 10:40am | PS2+PV-MoM8 Atomic Hydrogen Induced Defect Kinetics in Hydrogenated Amorphous Silicon: An In Situ Real Time Study M.C.M. van de Sanden, F.J.J. Peeters, Eindhoven University of Technology, The Netherlands, J. Zheng, Peking University, China, I.M.P. Aarts, ASML, The Netherlands, A.C.R. Pipino, Tanner Research, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 11:00am | PS2+PV-MoM9 Invited Paper Hydrogen-dominated Plasma, Due to Silane Depletion, for Microcrystalline Silicon Deposition A.A. Howling, R. Sobbia, Ch. Hollenstein, EPFL Lausanne, Switzerland |
| 11:40am | PS2+PV-MoM11 Plasma Uniformity Measurements in a Scalable, Multi-Electrode, VHF/UHF Plasma Source D. O'Farrell, A.R. Ellingboe, S. Linnane, C. Gaman, Dublin City University, Ireland |