| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS+MS-MoA1 Invited Paper Plasma Etch Challenges for 22nm Advanced Logic Development R. Wise, IBM |
| 2:40pm | PS+MS-MoA3 Invited Paper 22nm Technology Manufacturing Challenges - Window for Process Control becomes Smaller and Smaller, Equipment and Material Interaction Becomes Unpredictable and Manufacturing Costs Increase P. Adam, GLOBALFOUNDRIES Dresden, Germany |
| 3:40pm | PS+MS-MoA6 Invited Paper Logic Etch Challenges at the 22nm Node and Beyond V. Vahedi, G. Kamarthy, J. Guha, H. Singh, Lam Research Corporation |