AVS 56th International Symposium & Exhibition
    Manufacturing Science and Technology Thursday Sessions

Session MS-ThA
Manufacturing Issues in Nanoelectronics, PV and SSL

Thursday, November 12, 2009, 2:00 pm, Room C3
Moderator: C.Y. Sung, IBM Research Center


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm MS-ThA1 Invited Paper
Nanoelectrical and Nanomechanical Interconnect and Device Metrology for CMOS Extension
R.E. Geer, C.H. Chong, Y. Wang, University at Albany
2:40pm MS-ThA3
New Mechanism for Optically Stimulated Point Defect Control In Ultra-Shallow Junction Formation
P. Gorai, Y. Kondratenko, E.G. Seebauer, University of Illinois at Urbana-Champaign
3:00pm MS-ThA4
Thickness/Composition Metrology of Ultra-thin Lanthanum Oxide Cap Layer for CMOS Metal Gate Work Function Tuning
C.C. Wang, Y. Cao, G. Liu, X. Tang, Y. Uritsky, S. Gandikota, Applied Materials Inc.
3:40pm MS-ThA6
Sidewall Image Transfer for Sub Lithographic Pitch Scaling for the 22nm CMOS Node & Beyond
S. Kanakasabapathy, IBM Research, R.H. Kim, Global Foundries, A. Ko, A. Metz, Tokyo Electron Limited, Japan, T. Osabe, Hitachi Technologies, Japan, S. Schmitz, T. Standaert, IBM Systems and Technology
4:00pm MS-ThA7
Wafer-level Process Sampling, Metrology and Testing for MEMS and Solar Photovoltaic Applications
V. Ngo, FEI Company
4:20pm MS-ThA8
Establish Degradation Rates of Photovoltaic Modules and Systems Trough Comprehensive Electrical and Mechanical Analysis
A. Leyte-Vidal, K. Davis, W. Wilson, R. Reedy, N. Hickman, Florida Solar Energy Center, S. Kurtz, National Renewable Energy Laboratory