AVS 55th International Symposium & Exhibition | |
Surface Science | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | SS+EM+NC-FrM1 Invited Paper From Nanochemistry to Active Nano-Objects at Semiconductor Surfaces P.G. Soukiassian, Commissariat à l'Energie Atomique and Université de Paris-Sud/Orsay, France |
9:00am | SS+EM+NC-FrM3 Chemistry of the Si-rich β-SiC(100) Surface Compared to the Si(100) Surface S.M. Casey, L.N. Adhikari, University of Nevada, Reno |
9:20am | SS+EM+NC-FrM4 Surface Band Bending in GaN M. Ruchala, M. Foussekis, H. Morkoc, M.A. Reshchikov, A.A. Baski, Virginia Commonwealth University |
9:40am | SS+EM+NC-FrM5 An Accelerated Molecular Dynamics Study of Diffusion on the GaAs (001) β2(2x4) Reconstruction M.H. Mignogna, K.A. Fichthorn, The Pennsylvania State University |
10:00am | SS+EM+NC-FrM6 First Principles Investigation of Dimer Ordering on III-V Semiconductor Surfaces J.C. Thomas, J.E. Bickel, J.M. Millunchick, A. Van der Ven, University of Michigan |
10:20am | SS+EM+NC-FrM7 Hydroxyl Termination and Passivation of the Group III-rich (4x2)/c(8x2) Surfaces of InAs(001) and InGaAs(001) Surface Studied by STM, STS, and DFT J.B. Clemens, T. Song, A.C. Kummel, University of California, San Diego |
10:40am | SS+EM+NC-FrM8 Pit Nucleation in the Presence of (nx3) and β2(2x4) Surface Reconstructions on In.81Ga.19As/InP Films L.E. Sears, A. Riposan, J.M. Millunchick, University of Michigan - Ann Arbor |
11:00am | SS+EM+NC-FrM9 In-situ ALD Studies of Al- and La-oxide on In0.53Ga0.47As M. Milojevic, University of Texas at Dallas, B. Brennan, Dublin City University, Ireland, H.C. Kim, University of Texas at Dallas, F.S. Aguirre-Tostado, The University of Texas at Dallas, J. Kim, R.M. Wallace, University of Texas at Dallas, G. Hughes, Dublin City University, Ireland |
11:20am | SS+EM+NC-FrM10 Atomic Scale Investigation of Mn Impurities on the InAs(110) Surface Y.J. Song, University of Maryland, College Park and NIST, G.M. Rutter, P.N. First, Georgia Institute of Technology, N. Zhitenev, J.A. Stroscio, National Institute of Standards and Technology |