AVS 55th International Symposium & Exhibition
    MEMS and NEMS Monday Sessions

Session MN+NC-MoA
Fabrication at the Micro- and Nano- Scales for MEMS/NEMS

Monday, October 20, 2008, 2:00 pm, Room 206
Moderator: A.V. Sumant, Argonne National Laboratory


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm MN+NC-MoA1 Invited Paper
Large Area Nanofabrication for MEMS Applications
L.E. Ocola, A. Imre, Argonne National Laboratory
2:40pm MN+NC-MoA3
Large-scale Fabrication of Silicon Nanowire NEMS Devices Using a Top-down Approach
C.S. Roper, University of California, Berkeley, R.T. Howe, Stanford University, R. Maboudian, University of California, Berkeley
3:00pm MN+NC-MoA4
Fabrication of Nanopore and Nanochannel Structures through E-Beam Lithography and Atomic Layer Deposition Processes
S.W. Nam, IBM T.J. Watson Research Center & Seoul National University, Korea, M.J. Rooks, R. Sirdeshmukh, IBM T.J. Watson Research Center, K.B. Kim, IBM T.J. Watson Research Center & Seoul National University, Korea, S.M. Rossnagel, IBM T.J. Watson Research Center
3:20pm MN+NC-MoA5
Fabrication of Nickel-tipped Cantilevers for Magnetic Resonance Force Microscopy
S.A. Hickman, Cornell University, J. Van Delden, Eigenphase Technologies, L.E. Harrell, United States Military Academy, S.R. Garner, J.C. Ong, S. Kuenh, J.A. Marohn, Cornell University
4:00pm MN+NC-MoA7
A Process for Control of the Support Conditions of Nanomechanical Beam Resonators, and Evaluation of the Resulting Impact on Mechanical Dissipation
R. Barton, S.S. Verbridge, B.R. Ilic, H.G. Craighead, J.M. Parpia, Cornell University
4:20pm MN+NC-MoA8
Dynamic-Mode Multidirectional UV Lithography with Liquid State Photoresist
J.K. Kim, Y.K. Yoon, University at Buffalo
4:40pm MN+NC-MoA9
Development of High Rate Etching for Deep Si Etching in Advanced NLD Plasma
T. Murayama, T. Morikawa, K. Suu, ULVAC, Inc., Japan
5:00pm MN+NC-MoA10
XeF2 Etching of Si and Mo for MEMS Manufacturing
J.-F. Veyan, Y.J. Chabal, University of Texas at Dallas, X.-M. Yan, A. Londergan, E. Gousev, Qualcomm
5:20pm MN+NC-MoA11
A Versatile, Bilayer Resist Method for Creating Silica Microstructures
B.R. Cipriany, B.R. Ilic, H.G. Craighead, Cornell University