HIPIMS coating technology has been rapidly growing over the past few years due to the availability of R&D scale supply offerings. This has resulted in many new breakthroughs in application enhancement, production scalability, and efficiency. The number of applications where HIPIMS is now considered is also advancing. Breakthroughs in HIPIMS controllability have enabled researchers to find a variety of ideal operating parameter sets for various performance requirements. One of the most significant technical advances is a reverse positive kick pulse. This option provides a significant variable for driving out film stress in HIPIMS applications and increasing yield rates, which have been a major downside to HIPIMS in the past. These advances open up new possibilities for the technology and the enhancement of many thin film applications. This presentation will highlight examples of these applications along with the advantages associated with HIPIMS and the Kick pulse technology. It will show how these advances can be scaled to larger scale production applications and provide examples of what enhancements can be expected.