| AVS 66th International Symposium & Exhibition | |
| Frontiers of New Light Sources Applied to Materials, Interfaces, and Processing Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 4:00pm | LS+AC+HC+SS-ThA6 Resolving X-ray Based Spectroscopies in the Sub-nanometer Regime: Enabling Atomic Scale Insights into CO Adsorption on Thin Film Surfaces Heath Kersell, B. Eren, C.H. Wu, Lawrence Berkeley National Laboratory, I. Waluyo, A. Hunt, Brookhaven National Laboratory, G.A. Somorjai, M.B. Salmeron, Lawrence Berkeley National Laboratory |
| 4:20pm | LS+AC+HC+SS-ThA7 Imaging with XPS: Advanced Characterization for Advanced Materials and Devices Tatyana Bendikov, H. Kaslasi, E. Sanders, E. Joselevich, D. Cahen, Weizmann Institute of Science, Israel |
| 4:40pm | LS+AC+HC+SS-ThA8 Invited Paper Time-Resolved Photoemission with Free-Electron Lasers Kai Rossnagel, CAU Kiel / DESY, Germany |
| 5:20pm | LS+AC+HC+SS-ThA10 Invited Paper Ultrafast Magnetization Dynamics on the Nanoscale Bastian Pfau, Max Born Institute, Germany |