AVS 66th International Symposium & Exhibition
    Advanced Ion Microscopy and Ion Beam Nano-engineering Focus Topic Thursday Sessions

Session HI+NS-ThM
Novel Beam Induced Material Engineering and Nano-Patterning

Thursday, October 24, 2019, 8:00 am, Room B231-232
Moderators: Olga S. Ovchinnikova, Oak Ridge National Laboratory, Shinichi Ogawa, National Institute of Advanced Industrial Science and Technology (AIST)


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Click a paper to see the details. Presenters are shown in bold type.

8:00am HI+NS-ThM1 Invited Paper
Tuning out-of-plane Piezoelectricity in 2D Materials using Ion Beams
Yunseok Kim, Sungkyunkwan University, Republic of Korea
8:40am HI+NS-ThM3 Invited Paper
Defect Engineering of Ferroelectric Thin Films – Leveraging Ion Beams for Improved Function
Lane Martin, University of California at Berkeley
9:20am HI+NS-ThM5
Exploring Proximity Effects and Large Depth of Field in Helium Ion Beam Lithography: Large-area Dense Patterns and Tilted Surface Exposure
Ranveig Flatabø, Univeristy of Bergen, Norway, A. Agarwal, Massachusetts Institute of Technology, R. Hobbs, Trinity College Dublin, M. M. Greve, Univeristy of Bergen, B. Holst, Univeristy of Bergen, Norway, K.K. Berggren, Massachusetts Institute of Technology
9:40am HI+NS-ThM6
Fabrication of Plasmonic Nanostructures by Helium-Ion Milling
André Beyer, M. Westphal, Bielefeld University, Germany, S. Stephan, Oldenburg University, Germany, D. Emmrich, H. Vieker, Bielefeld University, Germany, K. Chen, Jinan University, Guangzhou, China, G. Razinskas, H. Gross, B. Hecht, Würzburg University, Germany, M. Silies, Oldenburg University, Germany, A. Gölzhäuser, Bielefeld University, Germany
11:00am HI+NS-ThM10 Invited Paper
Towards Atomically Precise Carbon Quantum Electronic Devices
J.L. Swett, University of Oxford, UK, O. Dyck, S. Jesse, Oak Ridge National Laboratory, Jan Mol, Queen Mary University of London, UK
11:40am HI+NS-ThM12
Fabrication of High-Q nanofiber Bragg Cavity Using a Helium Ion Microscope
Hideaki Takashima, A. Fukuda, H. Maruya, T. Tashima, Kyoto university, Japan, A. Schell, Central European Institute of Technology, Czech Republic, S. Takeuchi, Kyoto University, Japan
12:00pm HI+NS-ThM13
Time of Flight Secondary Ion Mass Spectrometry in the Helium Ion Microscope for Battery Materials and Other Nanoscale Problems
N. Klingner, Helmholtz Zentrum Dresden-Rossendorf, Germany, Gregor Hlawacek, Helmholtz-Zentrum Dresden Rossendorf, Germany, L.J. Wheatcroft, B.J. Inkson, University of Sheffield, UK, R. Heller, Helmholtz Zentrum Dresden-Rossendorf, Germany