AVS 66th International Symposium & Exhibition
    Fundamental Aspects of Material Degradation Focus Topic Thursday Sessions

Session DM+BI+SS-ThM
Material Stabilities and Technology for Degradation Protection

Thursday, October 24, 2019, 8:00 am, Room A212
Moderators: Markus Valtiner, Vienna University of Technology, Austria, Gareth S. Parkinson, TU Wien, Austria


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am DM+BI+SS-ThM1
Extremely Thin Protective Oxide Layer for Reflective Silver Thin Films
Midori Kawamura, E. Kudo, Y. Sasaki, T. Kiba, Y. Abe, K.H. Kim, Kitami Institute of Technology, Japan, H. Murotani, Tokai University, Japan
8:20am DM+BI+SS-ThM2
Influence of the Electric Double Layer on Degradation of Materials
Dominik Dworschak, M. Valtiner, Vienna University of Technology, Austria
8:40am DM+BI+SS-ThM3 Invited Paper
Key Issues for the Stability of Protective Surface Oxides
Philippe Marcus, CNRS - Chimie ParisTech, France
9:20am DM+BI+SS-ThM5
Controlling and Observing Localized Dealloying Corrosion and Dissolution via Lateral Modification of Surfactant Inhibitor Layers
S. Neupane, Hasselt University, Belgium, Frank Uwe Renner, IMEC vzw. Division IMOMEC, Belgium
9:40am DM+BI+SS-ThM6
In Situ Characterization of Interactions at Polymer/Metal Oxide Interfaces Under Aqueous Conditions by a Spectro-electrochemical Approach
Sven Pletincx, Vrije Universiteit Brussel, Belgium, L.-L. Fockaert, J.M.C. Mol, Delft University of Technology, Netherlands, H. Terryn, T. Hauffman, Vrije Universiteit Brussel, Belgium
11:00am DM+BI+SS-ThM10 Invited Paper
Design of Corrosion Resistant High Entropy Alloys
Gerald Frankel, C.D. Taylor, W. Windl, The Ohio State University, J.R. Scully, University of Virginia, J. Locke, The Ohio State University, P. Lu, Questek Innovations
11:40am DM+BI+SS-ThM12
Determination of Hydrogen in High Strength Steels using Scanning Kelvin Probe Force Microscopy
Ines Traxler, G. Schimo-Aichhorn, CEST Competence Centre for Electrochemical Surface Technology, Austria, A. Muhr, G. Luckeneder, H. Duchaczek, K.-H. Stellnberger, voestalpine Stahl GmbH, Austria, D. Rudomilova, T. Prosek, University of Chemistry and Technology Prague, Czech Republic, B. Lutzer, CEST Competence Centre for Electrochemical Surface Technology, Austria, D. Stifter, S. Hild, Johannes Kepler University Linz, Austria
12:00pm DM+BI+SS-ThM13
Reflection Mode Interferometry for studying interfacial processes
Kai Schwenzfeier, P. Bilotto, M. Lengauer, C. Merola, H.-W. Cheng, M. Valtiner, TU Wien, Austria