| AVS 66th International Symposium & Exhibition | |
| Applied Surface Science Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS+BI+RA-TuM1 Invited Paper Oxygen Energy Filtering and Relative Sensitivity Factor Considerations for Making U and Pu Measurements by LG-SIMS Todd Williamson, Los Alamos National Laboratory |
| 8:40am | AS+BI+RA-TuM3 Utilizing Large Geometry Secondary Ion Mass Spectrometry for Age-Dating of Individual Uranium Particles Christopher Szakal, D.S. Simons, J.D. Fassett, National Institute of Standards and Technology (NIST), A.J. Fahey, Corning Inc. |
| 9:00am | AS+BI+RA-TuM4 Peak Shape Analysis in TOF SIMS: Best Practices and Limiting Precision in Accounting for Detector Saturation Lev Gelb, A.V. Walker, University of Texas at Dallas |
| 9:20am | AS+BI+RA-TuM5 Electronic Structure and Band Gaps of Industrially Relevant Materials Investigated by Photoelectron Spectroscopy and REELS (Reflection Electron Energy Loss Spectroscopy) Paul Mack, T.S. Nunney, Thermo Fisher Scientific, UK, H.M. Meyer III, Oak Ridge National Laboratory |
| 9:40am | AS+BI+RA-TuM6 Practical References for Low Energy Ion Scattering by Ca and F S. Průsa, T. Šikola, Brno University of Technology, Czech Republic, Hidde Brongersma, IONTOF Technologies GmbH, Germany/Eindhoven University of Technology, Eindhoven, The Netherlands, Germany |
| 11:00am | AS+BI+RA-TuM10 Extreme-Ultraviolet-Assisted Atom Probe Tomography Norman Sanford, L. Miaja Avila, National Institute of Standards and Technology (NIST), P. Blanchard, National Institute of Sandards and Technology (NIST), D.R. Diercks, B. Gorman, Colorado School of Mines, A. Chiaramonti, National Institute of Sandards and Technology (NIST) |
| 11:20am | AS+BI+RA-TuM11 A Multi-Technique Approach for Complete Thin Film Characterisation Sarah Coultas, J.D.P. Counsell, N. Gerrard, C.J. Blomfield, Kratos Analytical Limited, UK, C. Moffitt, Kratos Analytical Limited, T. Conard, IMEC, Belgium |
| 11:40am | AS+BI+RA-TuM12 Polymeric Barrier Coatings for Silicone Elastomer against Diffusion of Isocyanate in Vacuum Casting Processes Martin Wortmann, R. Petkau, Bielefeld University of Applied Sciences, Germany, N. Frese, Bielefeld University, Germany, E. Moritzer, Paderborn University, Germany, A. Gölzhäuser, Bielefeld University, Germany, B. Hüsgen, Bielefeld University of Applied Sciences, Germany |
| 12:00pm | AS+BI+RA-TuM13 pARXPS Study of GeSbTe Surface Oxidation Ludovic Goffart, ST Microelectronics/LTM/CEA-LETI, France, C. Vallée, Laboratoire des Technologies de la Microélectronique (LTM), France, B. Pelissier, LTM, Univ. Grenoble Alpes, CEA-LETI, France, J-P. Reynard, D. Benoit, ST Microelectronics, France, G. Navarro, CEA-LETI, France |