AVS 66th International Symposium & Exhibition, Session AS+BI+RA-MoM

AVS 66th International Symposium & Exhibition
Applied Surface Science Division	Monday Sessions

Session AS+BI+RA-MoM
Quantitative Surface Analysis I/Reproducibility Issues in Quantitative XPS

Monday, October 21, 2019, 8:20 am, Room A211
Moderators: Donald Baer, Pacific Northwest National Laboratory, Mark Engelhard, Pacific Northwest National Laboratory

Click here to Download program book for this session
in Adobe Acrobat format

Click a paper to see the details. Presenters are shown in bold type.

8:20am	AS+BI+RA-MoM1 Invited Paper Improving Accuracy in Quantitation by XPS: Standards, Cross-sections, Satellite Structure C. Richard Brundle, C.R.Brundle & Associates, P.S. Bagus, University of North Texas, B.V. Crist, XPS International LLC
9:00am	AS+BI+RA-MoM3 A Rigorous Approach to the Calculation of the Uncertainties in XPS Analysis A. Herrera-Gomez, CINVESTAV-Unidad Queretaro, México, Orlando Cortazar-Martinez, CINVESTAV-Unidad Queretaro, Mexico
9:20am	AS+BI+RA-MoM4 Gross Errors in XPS Peak Fitting Matthew Linford, V. Jain, G.H. Major, Brigham Young University
9:40am	AS+BI+RA-MoM5 Improved Energy Referencing in XPS Hagai Cohen, Weizmann Institute of Science, Israel
10:00am	AS+BI+RA-MoM6 How to Avoid Errors in the Interpretation of XPS Data? Andreas Thissen, P. Dietrich, SPECS Surface Nano Analysis GmbH, Germany, W.E.S. Unger, Bundesanstalt für Materialforschung und -prüfung - Berlin (Germany), Germany
10:40am	AS+BI+RA-MoM8 Misinterpretations in the Spectroscopic Analysis of Heterogeneous Materials and Defected Structures Lisa Swartz, K. Artyushkova, J.E. Mann, B.W. Schmidt, J.G. Newman, Physical Electronics
11:00am	AS+BI+RA-MoM9 Current Issues and Solutions for Reliable, Robust and Reproducible XPS Spectral Acquisition and Data Reporting J.D.P. Counsell, C.J. Blomfield, Kratos Analytical Limited, UK, Christopher Moffitt, Kratos Analytical Limited, N. Gerrard, S.J. Coultas, Kratos Analytical Limited, UK
11:20am	AS+BI+RA-MoM10 Intensity Calibration and Sensitivity Factors for XPS Instruments with Monochromatic Ag Lα and Al Kα Sources A.G. Shard, National Physical Laboratory, UK, J.D.P. Counsell, Christopher Blomfield, Kratos Analytical Limited, UK, D.J.H. Cant, National Physical Laboratory, UK, E.F. Smith, University of Nottingham, UK, P. Navabpour, Teer Coatings Ltd, UK
11:40am	AS+BI+RA-MoM11 Reporting XPS Measurements and How Can We Do Better to Minimize Reproducibility Problems Karen Gaskell, University of Maryland, College Park